Patents Assigned to Ritek Corporation
  • Patent number: 8584918
    Abstract: A fracturing apparatus is provided. The fracturing apparatus includes a first board portion, a pressing element, a first suction device, a second board portion, a second suction device, and a cylinder. The first suction device is secured to the first board portion. The second board portion is rotatably connected to the first board portion. The second suction device is secured to the second board portion. The pressing element is secured to the first board portion and disposed between the first board portion and the second board portion. The cylinder is located on the first board portion and includes a piston rod rotatably connected to the second board portion. When the piston rod extends, the second board portion is pressed by the piston rod and swiveled about the first board portion.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: November 19, 2013
    Assignee: Ritek Corporation
    Inventors: Chih-Chieh Su, Sheng-Hong Tsai, Tyng-Bin Huang
  • Publication number: 20130181692
    Abstract: A power supply system for supplying a power to a device is disclosed. The power supply system includes a solar cell and a regulator coupled with the solar cell. The solar cell receives and converts sunlight into an output voltage. The regulator converts the output voltage into a desired voltage level to be supplied to the device. The regulator is a DC-DC converter.
    Type: Application
    Filed: January 12, 2012
    Publication date: July 18, 2013
    Applicant: RITEK CORPORATION
    Inventors: Tien-Lung LEE, Jong-Hann JEAN, Chia-Hong CHEN
  • Publication number: 20130181026
    Abstract: A fracturing apparatus is provided. The fracturing apparatus includes a first board portion, a pressing element, a first suction device, a second board portion, a second suction device, and a cylinder. The first suction device is secured to the first board portion. The second board portion is rotatably connected to the first board portion. The second suction device is secured to the second board portion. The pressing element is secured to the first board portion and disposed between the first board portion and the second board portion. The cylinder is located on the first board portion and includes a piston rod rotatably connected to the second board portion. When the piston rod extends, the second board portion is pressed by the piston rod and swiveled about the first board portion.
    Type: Application
    Filed: January 12, 2012
    Publication date: July 18, 2013
    Applicant: RITEK CORPORATION
    Inventors: Chih-Chieh SU, Sheng-Hong TSAI, Tyng-Bin HUANG
  • Publication number: 20130148487
    Abstract: Disclosed herein is an optical disc having an information area situated between an internal edge and an external edge of the optical disc. The optical disc includes a first substrate, a second substrate, a recording layer, a reflecting layer and a number of surface structures. The second substrate is disposed over the second substrate, the recording layer and the reflecting layer are disposed between the two substrates, and the reflecting layer is disposed between the first substrate and the recording layer. The surface structures are discontinuously disposed on the surface of the second substrate.
    Type: Application
    Filed: February 5, 2013
    Publication date: June 13, 2013
    Applicant: RITEK CORPORATION
    Inventor: RITEK CORPORATION
  • Patent number: 8462607
    Abstract: Disclosed herein is an optical disc having an information area situated between an internal edge and an external edge of the optical disc. The optical disc includes a first substrate, a second substrate, a recording layer, a reflecting layer and a number of surface structures. The second substrate is disposed over the second substrate, the recording layer and the reflecting layer are disposed between the two substrates, and the reflecting layer is disposed between the first substrate and the recording layer. The surface structures are discontinuously disposed on the surface of the second substrate.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: June 11, 2013
    Assignee: Ritek Corporation
    Inventors: Shih-Mim Chang, Shing-Tang Liao, Chien-Chang Lu
  • Patent number: 8435620
    Abstract: Disclosed herein is a recording material for an optical recording medium. The recording material has a composition represented by a general formula of BixGeyO(1-x-y), in which x and y respectively are atomic ratios of bismuth and germanium, and satisfy the requirements of the following formulae: 2.8?(x/y)?25 and 0.55?(1?x?y)?0.62.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: May 7, 2013
    Assignee: Ritek Corporation
    Inventors: Wei-Hsiang Wang, Po-Fan Hsu, Wei-Chong Li
  • Publication number: 20130065008
    Abstract: Disclosed herein is a recording material for an optical recording medium. The recording material has a composition represented by a general formula of BixGeyO(1-x-y), in which x and y respectively are atomic ratios of bismuth and germanium, and satisfy the requirements of the following formulae: 2.8?(x/y)?25 and 0.55?(1?x?y)?0.62.
    Type: Application
    Filed: September 9, 2011
    Publication date: March 14, 2013
    Applicant: RITEK CORPORATION
    Inventors: Wei-Hsiang WANG, Po-Fan HSU, Wei-Chong LI
  • Publication number: 20120181714
    Abstract: Disclosed herein is a method for manufacturing a master plate of an optical disc. The method comprises the step of: (a) forming an inorganic resist layer on a substrate; (b) forming an organic photoresist layer on and in contact with the inorganic resist layer; (c) irradiating both the organic photoresist layer and the inorganic resist layer with a laser beam to form a first exposed region of the inorganic resist layer and a second exposed region of the organic photoresist layer; (d) removing the inorganic resist layer of the first exposed region and the organic photoresist layer of the second exposed region; (e) removing the patterned organic photoresist layer from the patterned inorganic resist layer; (f) conformally forming a release layer to cover the patterned inorganic resist layer; (g) plating a metal layer on the release layer; and (h) separating the metal layer and the release layer.
    Type: Application
    Filed: January 14, 2011
    Publication date: July 19, 2012
    Applicant: RITEK CORPORATION
    Inventor: Chun-Cheng Chang
  • Publication number: 20120156625
    Abstract: Disclosed herein is a nano-fabrication method, which includes the step of: (a) forming an inorganic resist layer on a substrate; (b) forming an organic photoresist layer on the inorganic resist layer; (c) irradiating both the organic photoresist layer and the inorganic resist layer with a laser beam to form a first exposed region of the inorganic resist layer and a second exposed region of the organic photoresist layer; (d) removing the inorganic resist layer of the first exposed region and the organic photoresist layer of the second exposed region to form a patterned inorganic resist layer and a patterned organic photoresist layer; and (e) removing the patterned organic photoresist layer from the patterned inorganic resist layer.
    Type: Application
    Filed: December 21, 2010
    Publication date: June 21, 2012
    Applicant: RITEK CORPORATION
    Inventor: Chun-Cheng Chang
  • Patent number: 8022382
    Abstract: A phase change memory device and a method of forming the same are provided. The phase change memory device includes a conducting electrode in a dielectric layer, a bottom electrode over the conducting electrode, a phase change layer over the bottom electrode, and a top electrode over the phase change layer. The phase change memory device may further include a heat sink layer between the phase change layer and the top electrode. The resistivities of the bottom electrode and the top electrode are preferably greater than the resistivity of the phase change material in the crystalline state.
    Type: Grant
    Filed: March 3, 2006
    Date of Patent: September 20, 2011
    Assignees: Taiwan Semiconductor Manufacturing Company, Ltd., Ritek Corporation
    Inventors: Li-Shyue Lai, Denny Duan-lee Tang, Wen-chin Lin, Teng-Chien Yu, Hui-Fang Tsai, Wei-Hsiang Wang, Shyhyeu Wang
  • Publication number: 20100314973
    Abstract: A piezoelectric device is disclosed. The piezoelectric device includes a first magnetic layer, a second magnetic layer and a piezoelectric layer. The piezoelectric layer is disposed between the first magnetic layer and the second magnetic layer. Both the first magnetic layer and the second magnetic layer are electrically conductive layers and are capable of generating magnetic fields.
    Type: Application
    Filed: June 10, 2009
    Publication date: December 16, 2010
    Applicant: Ritek Corporation
    Inventor: Wei-Hsiang Wang
  • Publication number: 20100302703
    Abstract: A capacitor is disclosed. The capacitor includes a conductive and non-magnetic layer, a magnetic and conductive layer, and a dielectric layer. The dielectric layer is disposed between the conductive and non-magnetic layer and the magnetic and conductive layer. The magnetic and conductive layer is capable of generating a magnetic field, and thus enhances the dielectric constant of the dielectric layer for at least 10 folds.
    Type: Application
    Filed: July 24, 2009
    Publication date: December 2, 2010
    Applicant: RITEK CORPORATION
    Inventor: Wein-Kuen HWANG
  • Patent number: 7768864
    Abstract: A non-volatile memory device capable of supplying power is provided. The non-volatile memory device includes an electrical storage device for supplying a stored power, a charging control circuit coupled to the electrical storage device, a non-volatile memory, an input/output (I/O) interface, and a power control circuit. The I/O interface connects an electronic apparatus for transmitting an external power output from the electronic apparatus to the non-volatile memory and the charging control circuit, such that the charging control circuit could control a charging current and a charging voltage of the electrical storage device. The power control circuit converts the stored power into a backup power, and monitors whether a voltage value of the external power is less than a predetermined value. If the result is positive, the power control circuit controls the charging control circuit to stop charging the electrical storage device, and outputs the backup power through the I/O interface.
    Type: Grant
    Filed: September 18, 2008
    Date of Patent: August 3, 2010
    Assignee: Ritek Corporation
    Inventor: Chwei-Jing Yeh
  • Publication number: 20100027365
    Abstract: A non-volatile memory device capable of supplying power is provided. The non-volatile memory device includes an electrical storage device for supplying a stored power, a charging control circuit coupled to the electrical storage device, a non-volatile memory, an input/output (I/O) interface, and a power control circuit. The I/O interface connects an electronic apparatus for transmitting an external power output from the electronic apparatus to the non-volatile memory and the charging control circuit, such that the charging control circuit could control a charging current and a charging voltage of the electrical storage device. The power control circuit converts the stored power into a backup power, and monitors whether a voltage value of the external power is less than a predetermined value. If the result is positive, the power control circuit controls the charging control circuit to stop charging the electrical storage device, and outputs the backup power through the I/O interface.
    Type: Application
    Filed: September 18, 2008
    Publication date: February 4, 2010
    Applicant: RITEK CORPORATION
    Inventor: Chwei-Jing Yeh
  • Publication number: 20080200041
    Abstract: The present disclosure relates to a storage device. The storage device comprises a frame having a hole and a printed circuit board embedded in the frame, wherein the printed circuit board has an extended part for forming a connector. The connector may pass through the hole and is exposed out the frame for interfacing the storage device with a host device. At least one memory device is mounted to the printed circuit board and electrically connected to the printed circuit board.
    Type: Application
    Filed: February 16, 2007
    Publication date: August 21, 2008
    Applicant: RITEK CORPORATION
    Inventors: Chih-Wei Lin, Chien-Hua Wu, Chia-Lin Shih, Chia-Ming Chen
  • Publication number: 20080163926
    Abstract: An organic solar cell including a substrate, an organic solar cell device, at least one hydrophobic polymer layer and at least one metal layer is provided. The hydrophobic polymer layer and the metal layer are alternately stacked on the organic solar cell device. The hydrophobic polymer layer is used to prevent moisture from entering the organic solar cell device. The metal layer is used to prevent moisture and oxygen from entering the organic solar cell device. A method for forming an organic solar cell is also disclosed in the specification.
    Type: Application
    Filed: March 13, 2007
    Publication date: July 10, 2008
    Applicant: Ritek Corporation
    Inventors: Ping-Tsung Huang, Hsiu-Chih Hsu, Chuan-Man Lan, Chao-Ting Chen
  • Publication number: 20080131602
    Abstract: Chemical vapor deposition (CVD) is used to synthesize single-wall carbon nanotubes by a catalytic reaction, and a method of preparing the catalyst is also provided. A transition metal catalyzing growth of carbon nanotubes, an oxide of a precursor metal preventing agglomeration of catalyst particles, and a precious metal are essentially consisted in the catalyst. The catalyst particles can be further dispersed by quasi-explosive effect occurred when the oxidized precious metal is reduced.
    Type: Application
    Filed: May 16, 2007
    Publication date: June 5, 2008
    Applicant: RITEK CORPORATION
    Inventors: Wei-Hsiang WANG, Cheng-Tzu KUO, Tsai-Hau HONG
  • Publication number: 20080132410
    Abstract: Chemical vapor deposition (CVD) is used to synthesize single-wall carbon nanotubes by a catalytic reaction, and a method of preparing the catalyst is also provided. A transition metal catalyzing growth of carbon nanotubes, an oxide of a precursor metal preventing agglomeration of catalyst particles, and a precious metal are essentially consisted in the catalyst. The catalyst particles can be further dispersed by quasi-explosive effect occurred when the oxidized precious metal is reduced.
    Type: Application
    Filed: May 16, 2007
    Publication date: June 5, 2008
    Applicant: RITEK CORPORATION
    Inventors: Wei-Hsiang WANG, Cheng-Tzu KUO, Tsai-Hau HONG
  • Publication number: 20080131351
    Abstract: Chemical vapor deposition (CVD) is used to synthesize single-wall carbon nanotubes by a catalytic reaction, and a method of preparing the catalyst is also provided. A transition metal catalyzing growth of carbon nanotubes, an oxide of a precursor metal preventing agglomeration of catalyst particles, and a precious metal are essentially consisted in the catalyst. The catalyst particles can be further dispersed by quasi-explosive effect occurred when the oxidized precious metal is reduced.
    Type: Application
    Filed: May 16, 2007
    Publication date: June 5, 2008
    Applicant: RITEK CORPORATION
    Inventors: Wei-Hsiang WANG, Cheng-Tzu KUO, Tsai-Hau HONG
  • Patent number: 7357654
    Abstract: An interface apparatus having a rotational mechanism for connecting with an interface port in an electronic product is provided. The interface apparatus comprises a body, a connector and a rotational mechanism. The connector is used for connecting with the interface port of an electronic device. The rotational mechanism links up the body with the connector. The rotational mechanism has one to five degrees of freedom of movements. One or a multiple of rotational junctions together provides the degrees of freedom of movements in the rotational mechanism.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: April 15, 2008
    Assignee: Ritek Corporation
    Inventors: Yu-Chuan Lin, Chun-Chieh Chen, Hung-Ju Shen, Chien-Hua Wu, Sheng-Lin Chiu, Huan-Tung Wang, Hsin-Chih Hung