Patents Assigned to Robert J. Ferran
  • Closed-loop sputtering system and method of operating same
    Patent number: 4201645
    Abstract: A closed-loop sputtering system for the deposition of thin films which includes a control means to maintain and control the voltage of the target electrode by control of the flow of gas to the plasma without measurement of the pressure of the system.
    Type: Grant
    Filed: June 26, 1978
    Date of Patent: May 6, 1980
    Assignee: Robert J. Ferran
    Inventor: Richard P. Riegert