Abstract: Improved compositions for polishing silicon, silica or silicon-containing articles is provided which consists of an aqueous medium, abrasive particles and an anion which controls the rate of removal of silica. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of work pieces, as well as products produced by such methods, are also provided.

Abstract: The invention is a process for preparing chemically active solid oxide particles useful for polishing, composed primarily of CeO.sub.2, or CeO.sub.2 together with other oxides, comprising: (a) forming an aqueous solution comprised of a water soluble trivalent cerium salt and an oxidizing agent and (b) aging said mixture in the liquid state for a time not less than 4 hours.

Abstract: Disclosed is a process for preparing activated compositions and the compositions derived therefrom which are suitable for polishing surfaces, particularly integrated circuits, wherein a base abrasive is activated by addition of a second cation whose oxide exhibits a higher polishing rate than the base abrasive alone. The activation is effected by chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium whose pH is at a level which is favorable for adsorption of the activating cation onto the base abrasive surface.

Abstract: An abrasive composition for use in polishing or planarizing the surface of a work piece is provided comprising about 30 to 50 percent of cerium oxide; about 8 to about 20 percent of fumed silica and about 15 to about 45 percent of precipitated silica. Methods using the composition to polish or planarize the surfaces of work pieces, as well as products produced by such methods, are also provided.

Abstract: A pad for planarizing the surface of a semiconductor wafer. The pad includes at least two layers. One layer has a hydrostatic modulus which is different from the hydrostatic modulus of the other pad.

Abstract: The present invention relates to a method of polishing a metal surface using an aqueous polishing composition for metal surfaces comprising water, an abrasive agent, such as sluminum oxide, cerium oxide, zirconium oxide, tin oxide, silicon dioxide, silicon carbide, titanium dioxide and titanium carbide and a salt, or combination of salts, such as aluminum chloride, zirconyl nitrate, zirconyl sulfate, cerium nitrate, aluminum nitrate, aluminum bromide, aluminum iodide, aluminum chloride, zirconyl chloride, tin chloride, aluminum perchlorate, magnesium chloride, zinc chloride, magnesium perchlorate and iron chloride.

Abstract: An improved polishing pad material is produced by modifying conventional poromeric materials in which a porous thermoplastic resin matrix, typically polyurethane, is reinforced with a fibrous network such as a felted mat of polyester fibers. The polishing material is modified by coalescing the resin among the fibers, preferably by heat treatment, to increase the porosity and hardness of the material as well increasing the surface activity of the resin. The polishing material may also incorporate polishing aids such as particulate abrasives and may also be used as a lapping or grinding material.

Abstract: A polishing pad material is provided with a cellular polymeric layer containing elongated cells normal to the major surfaces of the material, such that the cell openings on the polishing surface of the material comprise a majority of the surface area, and the cells have a mean diameter of about 50 to 200 microns with the diameter of the surface openings being preferably larger than the cell diameters below the surface. The cells are preferably cone-shaped and have a depth at least 1.5 times the diameter of the surface openings. The pad material is formed from a poromeric material, preferably polyurethane elastomer, with microporous cell walls having pore diameters less than 0.1 times the diameter of the cells.

Abstract: The present invention relates to a poromeric article of manufacture comprising a felt sheet of fibers impregnated with microporous elastomer having a work surface, side surfaces joining the work surface and a support surface joining the side surfaces, wherein a majority of the fibers are oriented primarily transverse to the work surface such that the majority of fiber ends adjacent to the work surface form an angle of between about 45.degree. and about 135.degree. with respect to the work surface, and preferably, wherein the fibers have a uni-directional orientation substantially perpendicular to the work surface. The present invention also includes a plurality of such articles bonded together and oriented such that the work surfaces of adjacent articles are substantially coplanar to form a laminated article of manufacture. Further, processes for making the basic and laminated articles are set forth as other aspects of the invention.

Abstract: A printing roller and cover therefor and a novel method for their manufacture are provided. A thin tube of heat shrinkable polymeric material is bonded to a metal or a rubber covered metal core. The thin tube is coated on its inner surface with a thermoplastic adhesive and the solvents in the adhesive are evaporated to produce a tack-free adhesive coating. The core is placed within the tube and the tube is heat shrunk around the core at a temperature sufficient to melt the adhesive, thus bonding the tube to the core. Preferably, the core is primed with an adhesive which will cross-link with the adhesive applied to the tube. The thermoplastic tube covering the core is preferably a long-lasting polymer substantially inert to chemical attack, such as a fluorinated hydrocarbon or polyolefin.