Abstract: A system for high purity cleaning of components includes a cleaning chamber which is maintained at a pressure above ambient atmospheric pressure. A gas-glide transporter extends through the cleaning chamber and includes a pair of slightly tilted elongate tubes having a plurality of tiny holes therein. The tubes communicate with a source of filtered pressurized nitrogen. A tray for carrying components to be cleaned is adapted to fit on the tubes and slide down the transporter on a frictionless cushion of nitrogen. Components are cleaned of very small particles by using a high pressure spray of individual droplets of solvent which knock the particles off the component to be cleaned. The particles, solvent and solvent vapor are swept away from the component being cleaned by a stream of dry, filtered air. Two types of solvent systems are shown.