Patents Assigned to Rohm and Haas Electric Materials LLC
  • Publication number: 20130164545
    Abstract: A composition comprising the following: A) a cure catalyst selected from Formula A: [NR1?R2?R3?R4?]+X???(Formula A), R1?, R2?, R3?, R4? are each independently selected from hydrogen, alkyl, substituted alkyl, aryl, or substituted aryl; X is a monovalent anion, and wherein at least one of R1?, R2?, R3? or R4? is a methyl; and B) a prepolymer formed from a first composition comprising: Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; R1, R2, R3 are described herein; Rb is selected from H or a saturated group comprising alkyl, alkylene, or alkylidene; R4, R5, R6 are described herein; Rc comprises more than one multiple bond, and these multiple bonds are in a conjugated configuration; R7, R8, R9 described herein; and R10, R11, R12, R13 described herein.
    Type: Application
    Filed: December 5, 2012
    Publication date: June 27, 2013
    Applicants: Rohm and Haas Electric Materials LLC, Dow Global Technologies LLC
    Inventors: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
  • Publication number: 20110256313
    Abstract: Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with the precursor compound for delivery into such CVD reactors.
    Type: Application
    Filed: June 28, 2011
    Publication date: October 20, 2011
    Applicant: Rohm and Haas Electric Materials LLC
    Inventor: Deodatta Vinayak SHENAI-KHATKHATE
  • Patent number: 7592125
    Abstract: New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero substitution (particularly hydroxy or thio) and ii) a second cross-linked resin. Preferred photoresists of the invention can be imaged at short wavelengths, such as sub-200 nm, particularly 193 nm.
    Type: Grant
    Filed: January 19, 2006
    Date of Patent: September 22, 2009
    Assignee: Rohm and Haas Electric Materials LLC
    Inventors: Yasuhiro Suzuki, Cheng-Bai Xu