Patents Assigned to ROHM AND HAAS ELECTRONIC MATERIALS
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Patent number: 11963439Abstract: The present disclosure relates to an organic electroluminescent compound and an organic electroluminescent device comprising the same. By comprising the compound according to the present disclosure, it is possible to produce an organic electroluminescent device having improved driving voltage, power efficiency, and/or lifetime properties compared to the conventional organic electroluminescent devices.Type: GrantFiled: August 24, 2022Date of Patent: April 16, 2024Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Eun-Joung Choi, Young-Kwang Kim, Su-Hyun Lee, So-Young Jung, YeJin Jeon, Hong-Se Oh, Dong-Hyung Lee, Jin-Man Kim, Hyun-Woo Kang, Mi-Ja Lee, Hee-Ryong Kang, Hyo-Nim Shin, Jeong-Hwan Jeon, Sang-Hee Cho
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Patent number: 11950506Abstract: The present disclosure relates to a plurality of host materials comprising a first host material comprising a compound represented by formula 1, and a second host material comprising a compound represented by formula 2, and an organic electroluminescent device comprising the same. By comprising a specific combination of compounds as host materials, it is possible to provide an organic electroluminescent device having lower driving voltage, higher luminous efficiency, higher power efficiency, and/or superior lifespan characteristics compared to conventional organic electroluminescent devices.Type: GrantFiled: October 20, 2020Date of Patent: April 2, 2024Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: So-Young Jung, Su-Hyun Lee, Mi-Ja Lee, Sang-Hee Cho, Doo-Hyeon Moon
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Patent number: 11940732Abstract: Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.Type: GrantFiled: April 15, 2021Date of Patent: March 26, 2024Assignee: Rohm and Haas Electronic Materials LLCInventors: Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Suzanne M. Coley, Li Cui, Paul J. LaBeaume, Deyan Wang
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Patent number: 11940730Abstract: Disclosed herein is a pattern formation method, comprising (a) applying a layer of a photoresist composition over a semiconductor substrate, (b) pattern-wise exposing the photoresist composition layer to i-line radiation; and (c) developing the exposed photoresist composition layer to provide a resist relief image; wherein the photoresist composition comprises a non-ionic photoacid generator; a solvent; a first polymer and a second polymer; and wherein the first polymer comprises a polymeric dye.Type: GrantFiled: December 29, 2021Date of Patent: March 26, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Mitsuru Haga, Mingqi Li
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Patent number: 11940731Abstract: Photoresist topcoat compositions comprise: a matrix polymer and a surface active polymer, wherein the surface active polymer comprises polymerized units of the following general formula (I): wherein: R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group, or a C1-C4 haloalkyl group; R2 independently represents a hydrogen atom or an optionally substituted alkyl group, wherein at least one R2 is not a hydrogen atom, wherein the R2 groups taken together optionally form a cyclic structure, and wherein the total number of carbon atoms for the R2 groups taken together is from 2 to 20; R3 represents an optionally substituted C1-C4 alkylene group, wherein an R2 group optionally forms a cyclic structure with R3; and R4 independently represents C1-C4 fluoroalkyl groups; wherein the total polymerized units of general formula (I) are present in the surface active polymer in an amount of 95 wt % or more based on total polymerized units of the surface active polymer; and wherein the surface active polymer iType: GrantFiled: June 24, 2019Date of Patent: March 26, 2024Assignee: Rohm and Haas Electronic Materials LLCInventors: Irvinder Kaur, Cong Liu, Doris Kang, Chunyi Wu
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Patent number: 11932713Abstract: New monomer and polymer materials that comprise one or more Te atoms. In one aspect, tellurium-containing monomers and polymers are provided that are useful for Extreme Ultraviolet Lithography.Type: GrantFiled: December 31, 2018Date of Patent: March 19, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Emad Aqad, James F. Cameron, James W. Thackeray
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Patent number: 11926591Abstract: The present disclosure relates to an organic electroluminescent compound and an organic electroluminescent device comprising the same. By comprising the organic electroluminescent compound of the present disclosure, an organic electroluminescent device having improved driving voltage, luminous efficiency, and/or lifespan characteristics can be provided.Type: GrantFiled: February 12, 2019Date of Patent: March 12, 2024Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Hong-Se Oh, Jeong-Eun Yang, Tae-Jin Lee, Sang-Hee Cho
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Patent number: 11930704Abstract: The present disclosure relates to an organic electroluminescent device. The organic electroluminescent device of the present disclosure comprises a specific combination of an electron buffer material and an electron transport material which can provide high efficiency and/or long lifespan.Type: GrantFiled: December 7, 2022Date of Patent: March 12, 2024Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Hee-Choon Ahn, Doo-Hyeon Moon, Sang-Hee Cho
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Patent number: 11920023Abstract: There is provided a dielectric composite material comprising (a) 20-50 weight % total solids of at least one thermosetting resin and other resin components; and (b) 50-70 weight % total solids of at least one inorganic particulate filler; where the at least one inorganic particulate filler is surface modified with one or more acrylic-based silane coupling agents.Type: GrantFiled: April 28, 2022Date of Patent: March 5, 2024Assignee: Rohm and Haas Electronic Materials LLC.Inventors: Colin Hayes, Colin Calabrese, Christine Hatter
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Patent number: 11923483Abstract: The present invention relates to method for producing LED by one step film lamination. The method comprises: laminating two or more LEDs with two or more colored phosphor films by one step film lamination; wherein each of the colored phosphor film comprises each other different colored phosphor composition which has a Maximum tan ?; and the difference of each Maximum tan ? varies within a range of 0-30%. In the present invention, the method for producing a LED may greatly improve production efficiency (i.e., dual and multi-color LEDs in one step) and lower cost of ownership. Further, it may improve uniformity of phosphor dispersion, thereby improve color quality of LEDs.Type: GrantFiled: May 18, 2018Date of Patent: March 5, 2024Assignees: DDP SPECIALTY ELECTRONIC MATERIALS US, LLC, ROHM AND HAAS ELECTRONC MATERIALS LLCInventors: Anna Ya Ching Feng, Lu Zhou
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Patent number: 11912916Abstract: The present disclosure relates to an organic electroluminescent compound represented by formula 1 and an organic electroluminescent device comprising the same. By comprising the organic electroluminescent compound of the present disclosure, it is possible to provide an organic electroluminescent device having lower operating voltage, higher luminous efficiency and/or longer lifespan properties as compared with a conventional organic electroluminescent device.Type: GrantFiled: July 1, 2019Date of Patent: February 27, 2024Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Hyun Kim, Ji-Song Jun, Jeong-Hwan Jeon, Yeon-Gun Lee, Seon-Jin Hwang, Young-Jun Cho
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Patent number: 11917907Abstract: The present disclosure relates to an organic electroluminescent device. The organic electroluminescent device of the present disclosure shows high luminous efficiency and good lifespan by comprising a specific combination of the plural kinds of host compounds and a specific hole transport compound.Type: GrantFiled: November 22, 2021Date of Patent: February 27, 2024Assignee: Rohm and Haas Electronic Materials Korea Ltd.Inventors: Kyoung-Jin Park, Tae-Jin Lee, Jae-Hoon Shim, Yoo Jin Doh, Hee-Choon Ahn, Young-Kwang Kim, Doo-Hyeon Moon, Jeong-Eun Yang, Su-Hyun Lee, Chi-Sik Kim, Ji-Song Jun
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Patent number: 11906493Abstract: Gas sensors are provided. The gas sensors comprise: a substrate; a plurality of electrodes on the substrate; and a polymeric sensing layer on the substrate for adsorbing a gas-phase analyte. The adsorption of the analyte is effective to change a property of the gas sensor that results in a change in an output signal from the gas sensor. The polymeric sensing layer comprises a polymer chosen from substituted or unsubstituted polyarylenes comprising the reaction product of monomers comprising a first monomer comprising an aromatic acetylene group and a second monomer comprising two or more cyclopentadienone groups, or a cured product of the reaction product. The gas sensors and methods of using such sensors find particular applicability in the sensing of gas-phase organic analytes.Type: GrantFiled: June 23, 2020Date of Patent: February 20, 2024Assignee: Rohm and Haas Electronic Materials LLCInventors: Catherine Mulzer, Christopher D. Gilmore, Hee Jae Yoon, Jaclyn Murphy, Brian Litchfield
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Patent number: 11897082Abstract: The invention provides a polishing pad suitable for polishing at least one of semiconductor, optical, magnetic or electromechanical substrates. The polishing pad includes a polyurea polishing layer and a polyurea matrix. The polyurea matrix has a soft phase and a hard phase. The soft phase is formed from soft segments and the hard phase is formed from diisocyanate hard segments and a curative agent. The soft segment areva copolymer of aliphatic fluorine-free polymer groups and a fluorocarbon having a length of a least six carbons. The polyurea matrix is cured with the curative agent and includes gas or liquid-filled polymeric microelements. The soft segments form a fluorine rich phase that concentrates adjacent the polymeric microelements and at the polishing layer during polishing. The polishing layer remains hydrophilic during polishing in shear conditions.Type: GrantFiled: September 11, 2021Date of Patent: February 13, 2024Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Matthew R. Gadinski, Joseph So
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Patent number: 11880134Abstract: New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.Type: GrantFiled: November 29, 2018Date of Patent: January 23, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Emad Aqad, James F. Cameron, James W. Thackeray
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Patent number: 11880135Abstract: Disclosed herein is a method comprising forming a radiation-sensitive film on a substrate; wherein the radiation-sensitive film comprises a radiation-sensitive composition comprising a photoacid generator; a quencher; an acid labile polymer formed from monomers comprising a vinyl aromatic monomer and a monomer comprising an acid decomposable group; and a solvent; patternwise exposing the radiation-sensitive film to activating radiation; and contacting the radiation-sensitive film with an alkaline developing solution to form a resist pattern.Type: GrantFiled: October 15, 2020Date of Patent: January 23, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Mitsuru Haga, Kunio Kainuma, Shugaku Kushida
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Patent number: 11874603Abstract: Disclosed herein is a photoresist composition comprising a first polymer comprising an acid labile group; a photoacid generator; and an acid diffusion control agent that comprises a tri-alkyl amide compound having a lipophilicity (log P) value that is greater than 11.Type: GrantFiled: September 15, 2021Date of Patent: January 16, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.Inventors: Philjae Kang, Kwang Mo Choi, Yoo Jung Yoon, Won Seok Lee, Hae-Jin Lim
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Patent number: 11859082Abstract: Disclosed herein is a copolymer comprising first polymerized units of the formula (1); wherein: R1 is H or a substituted or unsubstituted C1-C6 alkyl group; and R2 is a substituted or unsubstituted C3-C20 alkyl group that optionally includes one or more of —O—, —S—, —N—, —C(O)—, or —C(O)O—, —N—C(O)—, —C(O)—NR—; wherein R is H or a substituted or unsubstituted C1-C6 alkyl group; and second polymerized units of the formula (2): wherein: R3 is a substituted or unsubstituted C1-C6 alkyl group that optionally includes one or more of —O—, —N—, —S—, —C(O)—, or —C(O)O—; wherein the first polymerized units and the second polymerized units are chemically different, and the copolymer is free of fluorine.Type: GrantFiled: December 31, 2020Date of Patent: January 2, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Mingqi Li, Irvinder Kaur
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Patent number: 11852972Abstract: A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Z? is an organic anion; Ar1 is substituted or unsubstituted C4-60 heteroaryl group comprising a furan heterocycle; and R1 is substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Ar1 and R1 are optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Ar1 or substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through R1 or substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Z? as a pendant group to a polymer; and a solvent.Type: GrantFiled: October 30, 2020Date of Patent: December 26, 2023Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Tomas Marangoni, Emad Aqad, James W. Thackeray, James F. Cameron, Xisen Hou, ChoongBong Lee
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Patent number: D1018775Type: GrantFiled: April 19, 2023Date of Patent: March 19, 2024Assignee: ROHM AND HAAS ELECTRONIC MATERIALS SINGAPORE PTE, LTDInventors: Robert James McMahon, Ying Hao Teo, Tomasz Swiatek