Patents Assigned to Rohm and Haas Electronic Materials MCP Holdings, Inc.
  • Barrier polishing fluid
    Patent number: 7767581
    Abstract: The polishing fluid is useful for polishing tantalum-containing barrier materials of a semiconductor substrate. The polishing fluid includes a nitrogen-containing compound having at least two nitrogen atoms comprising imine compounds and hydrazine compounds. The nitrogen-containing compound is free of electron-withdrawing substituents; and the polishing fluid is capable of removing the tantalum-containing barrier materials from a surface of the semiconductor substrate without an abrasive.
    Type: Grant
    Filed: May 19, 2006
    Date of Patent: August 3, 2010
    Assignee: Rohm and Haas Electronic Materials MCP Holdings, Inc.
    Inventor: Jinru Bian