Patents Assigned to Roki Techno Co., Ltd.
  • Patent number: 11266933
    Abstract: A attachment and detachment apparatus removably attaches a filter container containing a filter, as a part of a filtration apparatus that filters fluid with the filter. The filter container includes a first mounting protrusion having a filter container flow path in fluid communication with the filter. An outer periphery surface of the first mounting protrusion includes at least two curved surfaces respectively formed to be at least a part of an arc surface. The attachment and detachment apparatus includes a first mounting protrusion holding part that holds the first mounting protrusion. The first mounting protrusion holding part having a holding part flow path for the fluid and a notch communicating between an area surrounded by the inner periphery surface and an outer side of the first mounting protrusion holding part.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: March 8, 2022
    Assignee: ROKI TECHNO CO., LTD.
    Inventor: Takashi Kinjo
  • Patent number: 11202980
    Abstract: A filter attachment and detachment apparatus removably attaching a filter container containing a filter, as a part of a filtration apparatus that filters fluid with the filter, includes a first mounting protrusion at one end of the filter container to protrude from the filter container, the first mounting protrusion including a flow path in fluid communication with the filter inside the filter container, a rotation element to which a first flow path for the fluid is connected, the rotation element including an opening groove configured to receive the first mounting protrusion, and a first mounting protrusion holding part configured to rotatably hold the rotation element.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: December 21, 2021
    Assignee: Roki Techno Co., Ltd.
    Inventor: Takashi Kinjo
  • Patent number: 10946325
    Abstract: There is a need to reduce the amount of overlapping parts of a nonwoven fabric of a filter component to thereby lengthen the life of the filter component. This need is met by the filter component formed of a cylindrical nonwoven fabric having a center axis, and having a plurality of polygon-shaped cross-sections which are a same shape that are formed side-by-side at predetermined intervals along the center axis. Each side of each of the polygons is formed by a mountain fold part on a plane perpendicular to the center axis, and each vertex of one polygon is connected by a mountain fold part to each vertex of another polygon, respectively.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: March 16, 2021
    Assignee: ROKI TECHNO CO., LTD.
    Inventors: Osamu Kumagai, Sachi Inagaki
  • Patent number: 10744432
    Abstract: The filter vessel attachment/detachment apparatus includes a first conduit end, wherein a first conduit for the fluid to flow through is coupled to the first conduit end, and the first conduit end has a clamping portion capable of clamping the flange of the filter vessel; a contact surface capable of strongly contacting to the inlet or the outlet of the filter vessel; and a guide member capable of, for a direction from the first conduit toward the inlet or the outlet, rotating about a second axis separated from a first axis by a predetermined distance, the first axis being from the first conduit toward the inlet, the guide member having a holding portion capable of holding the inlet or the outlet.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: August 18, 2020
    Assignee: Roki Techno Co., LTD.
    Inventors: Tetsuya Uchida, Hirofumi Kawagoe
  • Publication number: 20050274626
    Abstract: A polishing pad for electrolytically polishing an interconnect material of a device wafer by applying a direct-current voltage to the interconnect material as an anode and a cathode as a counter electrode while causing an electrolyte to come in contact with the anode and the cathode, the polishing pad includes a plurality of electrolytic cells formed by the anode, the cathode, and the electrolyte and having a contact surface smaller than the device wafer, the electrolytic cells being moved relative to the interconnect material when electrolytically polishing the interconnect material on the device wafer.
    Type: Application
    Filed: June 6, 2005
    Publication date: December 15, 2005
    Applicant: ROKI TECHNO CO., LTD.
    Inventor: Shigeru Tominaga
  • Patent number: 6561890
    Abstract: A polishing pad for use in chemical mechanical polishing is formed of silicone rubber. An abrasive fine inorganic powder and a reinforcing fine silica powder are dispersed in the silicone rubber, and the inorganic powder has a particle size of 0.01-100 &mgr;m and is contained in the amount of 10-85 wt.% of the silicone rubber.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: May 13, 2003
    Assignees: Ace Inc., Roki Techno Co., Ltd.
    Inventor: Shigeru Tominaga
  • Patent number: 5433851
    Abstract: A filter designed in compact form and requiring low filtration cost, by which there is no need to replace filter each time it becomes clogged and for which no liquid for backwashing is required, and with which is possible to filter under liquid pressure. In the filter, two ends of a filtering segment with a predetermined length of a filter medium in an oblong tube shape are movably and closely squeezed and held by a pair of opposing pressure rollers. A raw liquid introducing pipe is closely squeezed and held between a pair of pressure rollers, a forward end of the raw liquid introducing pipe is disposed within the range of the filtering segment of the tube-like filter medium. The filter medium is moved to the filtering segment constantly or when the filter medium is clogged, and the clogged filter medium is moved beyond the range of the filtering segment.
    Type: Grant
    Filed: April 13, 1994
    Date of Patent: July 18, 1995
    Assignee: Roki Techno Co., Ltd.
    Inventor: Mikio Itoh