Patents Assigned to ROVAK GMBH
  • Patent number: 11570858
    Abstract: A method for flashlamp control, in which a main pulse of the lamp current, producing a flash, is generated, and a pre-pulse of the lamp current is previously generated by application of a bias voltage includes a flashlamp with an ignition electrode, a bias voltage source, a main voltage source and a control system. The load of the flashlamp is minimized during the production of a main pulse by a pre-ignition. A pre-pulse is generated by applying a plasma voltage which is higher than the bias voltage, as an electrode voltage, and igniting a plasma in the flashlamp by means of an ignition electrode and maintaining same by means of the bias voltage during the pre-pulse.
    Type: Grant
    Filed: September 13, 2019
    Date of Patent: January 31, 2023
    Assignee: ROVAK GMBH
    Inventors: Udo Reichmann, Georg Ochlich, Marcel Neubert
  • Patent number: 11528786
    Abstract: A method for flashlamp control, in which a main pulse of the lamp current, producing a flash, is generated, and a pre-pulse of the lamp current is previously generated by application of a bias voltage includes a flashlamp with an ignition electrode, a bias voltage source, a main voltage source and a control system. The load of the flashlamp is minimized during the production of a main pulse by a pre-ignition. A pre-pulse is generated by applying a plasma voltage which is higher than the bias voltage, as an electrode voltage, and igniting a plasma in the flashlamp by means of an ignition electrode and maintaining same by means of the bias voltage during the pre-pulse.
    Type: Grant
    Filed: September 13, 2019
    Date of Patent: December 13, 2022
    Assignee: ROVAK GMBH
    Inventors: Udo Reichmann, Georg Ochlich, Marcel Neubert
  • Publication number: 20220223855
    Abstract: A method for producing silicon-based anodes for secondary batteries carries out the following steps for producing an anode: —depositing a silicon layer on a metal substrate having grain boundaries, wherein the silicon layer has a first boundary surface directed towards the metal substrate, —heating the metal substrate using a heating unit to a temperature between 200° C. and 1000° C., —conditioning the region of the second boundary surface of the silicon layer that is facing away from the metal substrate using an energy-intensive irradiation during the heating, generating polyphases in the region of the silicon layer and the metal substrate, made up of amorphous silicon and/or crystalline silicon of the silicon of the silicon layer and of crystalline metal of the metal substrate and of silicide and—generating crystalline metal of the metal substrate.
    Type: Application
    Filed: March 31, 2022
    Publication date: July 14, 2022
    Applicants: ROVAK GmbH, Technische Universitaet Bergakademie Freiberg, Helmholtz-Zentrum Dresden-Rossendorf e.V.
    Inventors: Charaf CHERKOUK, Dirk C. MEYER, Tilmann LEISEGANG, Teresa Orellana PEREZ, Slawomir PRUCNAL, Wolfgang SKORUPA
  • Publication number: 20220039222
    Abstract: A method for flashlamp control, in which a main pulse of the lamp current, producing a flash, is generated, and a pre-pulse of the lamp current is previously generated by application of a bias voltage includes a flashlamp with an ignition electrode, a bias voltage source, a main voltage source and a control system. The load of the flashlamp is minimized during the production of a main pulse by a pre-ignition. A pre-pulse is generated by applying a plasma voltage which is higher than the bias voltage, as an electrode voltage, and igniting a plasma in the flashlamp by means of an ignition electrode and maintaining same by means of the bias voltage during the pre-pulse.
    Type: Application
    Filed: September 13, 2019
    Publication date: February 3, 2022
    Applicant: ROVAK GMBH
    Inventors: Udo REICHMANN, Georg OCHLICH, Marcel NEUBERT