Patents Assigned to RTC Systems Ltd.
  • Apparatus and method for coating substrates
    Patent number: 6616818
    Abstract: Apparatus (10) for treating a substrate, comprising: a vacuum chamber (12); a substrate carrier (14) adapted to carry a substrate (16) to be treated; a source material holder (22) for holding a source material (34) with which the substrate (16) is to be treated; and vaporising or sputtering means (20) for vaporising/sputtering the source material (34); wherein the source material holder (22) includes a positioning means (24) for relatively moving the source material (34) towards the substrate carrier (14).
    Type: Grant
    Filed: August 8, 2001
    Date of Patent: September 9, 2003
    Assignee: RTC Systems Ltd.
    Inventor: Desmond Gibson
  • Apparatus and method for coating substrates
    Publication number: 20020153247
    Abstract: Apparatus (10) for treating a substrate, comprising: a vacuum chamber (12); a substrate carrier (14) adapted to carry a substrate (16) to be treated; a source material holder (22) for holding a source material (34) with which the substrate (16) is to be treated; and vaporising or sputtering means (20) for vaporising/sputtering the source material (34); wherein the source material holder (22) includes a positioning means (24) for relatively moving the source material (34) towards the substrate carrier (14).
    Type: Application
    Filed: August 8, 2001
    Publication date: October 24, 2002
    Applicant: RTC Systems Ltd.
    Inventor: Desmond Gibson