Patents Assigned to Rudolf Sacher Gesellschaft m.b.H.
  • Self-supporting mask, method for production as well as use of same
    Patent number: 4370556
    Abstract: Mask for use in the treatment of substrates with an image-forming medium. The mask foil is thermally prestressed by the frame at the temperature of use. For this purpose, the material of the frame has a higher coefficient of thermal expansion than the material of the mask foil. A method of manufacturing such masks includes the step wherein the mask foil is mounted in the frame at a temperature which lies below the temperature of use.
    Type: Grant
    Filed: December 16, 1980
    Date of Patent: January 25, 1983
    Assignee: Rudolf Sacher Gesellschaft m.b.H.
    Inventors: Gerhard Stengl, Hans Loschner