Abstract: A microwave plasma generating apparatus radiates a microwave to a source gas to produce a plasma. A plurality of spaced fins are disposed in a path of travel of the microwave, from the microwave guide to an area of origin of the plasma within the plasma generating chamber to lie in a direction perpendicular to the direction of an electric field of the microwave, for the purpose of locking the position at which the plasma has been produced.
Type:
Grant
Filed:
October 30, 1992
Date of Patent:
December 14, 1993
Assignees:
Ryohei Itatani, Idemitsu Petrochemical Company Ltd.