Patents Assigned to Süss Micro Tec Lithography GmbH
  • Device for aligning masks in photolithography
    Patent number: 6891602
    Abstract: The present invention provides a device for aligning masks in photolithography, wherein in a first mask holder for a first mask at least one adapter for a second mask can be provided, so that masks being adapted to either the first mask holder or to the at least one adapter can be used in the device. The invention is advantageous in that it allows an easy, time and cost saving changeover from one mask size to at least one different mask size.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: May 10, 2005
    Assignee: Süss Micro Tec Lithography GmbH
    Inventors: Nikolaus Maier, Ralf Süss, Richard Buttinger