Abstract: A developer for lithographic proof films is described. The developer composition contains a glycol acetate, a cyclic alkyl glycol, a surfactant and a cosolvent, all present in a water base. No nonaqueous component of the composition exceeds 30 weight percent of the composition. The compositions are nontoxic, nonflammable and have good odor characteristics while providing developer properties equal or superior to the high solvent content developers of the prior art. The developers may be used to develop both process color films and opaque films.