Patents Assigned to Saian Corporation
  • Publication number: 20130220793
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Application
    Filed: March 18, 2013
    Publication date: August 29, 2013
    Applicant: SAIAN CORPORATION
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 8425852
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: April 23, 2013
    Assignee: Saian Corporation
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 8128783
    Abstract: A plasma generator is provided which includes: a microwave generation portion which generates a microwave; a wave guide for propagating the microwave; a plurality of plasma generation nozzles which are attached to the wave guide so as to be apart from each other in the direction where the microwave is propagated, receive the microwave, and generate and emit a plasmatic gas based on the energy of this microwave; and a plurality of stabs which correspond to a part or the whole part of the plasma generation nozzles and are each disposed in the wave guide so as to lie in a rear position a predetermined distance apart from each other in the direction where the microwave is propagated.
    Type: Grant
    Filed: September 12, 2007
    Date of Patent: March 6, 2012
    Assignees: Amarante Technologies, Inc., Saian Corporation
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Masaaki Mike, Sang Hun Lee
  • Publication number: 20110286908
    Abstract: A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.
    Type: Application
    Filed: March 3, 2010
    Publication date: November 24, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Hidetaka Matsuuchi, Tomoyuki Hirose, Ryuichi Iwasaki, Masaaki Mike, Shigeru Masuda, Hirofumi Hayashi, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Publication number: 20110280765
    Abstract: An exhaust system is provided for exhausting an exhaust gas used for sterilizing an item to be sterilized by using a high concentration NO2 gas, including an ozone generator, a gas treatment means for adsorbing ozone generated by the ozone generator and NO2 in the exhaust gas and accelerating generation of dinitrogen pentoxide or nitric acid by a reaction of the ozone and NO2 to retain the resultant, and an exhaust apparatus for exhausting the exhaust gas. The exhaust system can effectively and ably purify a high concentration NO2 exhaust gas having a concentration beyond the normal level.
    Type: Application
    Filed: March 4, 2010
    Publication date: November 17, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Tomoyuki Hirose, Ryuichi Iwasaki, Kazuhiro Kimura, Shigeki Okumura, Kiyotaka Arai
  • Publication number: 20110274583
    Abstract: By focusing on the fact that nitrogen dioxide exhibits an increased sterilizing effect among other sterilant gases including nitrogen oxide, the present invention is made to provide a sterilization method which may be suitably used for sterilizing items to be sterilized such as medical instruments which require increased reliability by using a high concentration NO2 gas of 5,000 ppm or above, for example. An inside of a sterilizing chamber containing an item to be sterilized is humidified, and a concentration of NO2 in the sterilizing chamber is made to be from 9 to 100 mg/L by filling a high concentration NO2 gas.
    Type: Application
    Filed: March 10, 2010
    Publication date: November 10, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Hirofumi Hayashi, Tomoyuki Hirose, Kazuhiro Kimura, Masaaki Mike, Ryuichi Iwasaki, Shigeru Masuda, Toru Tanibata, Joongsoo Kim, Sang Hun Lee, Jae-Mo Koo, Orion Weihe, Andrew Way
  • Patent number: 8035057
    Abstract: Systems and methods for generating microwave plasma are disclosed. The present invention provides a microwave plasma nozzle (26) that includes a gas flow tube (40), and a rod-shaped conductor (34) that is disposed in the gas flow tube (40) and has a tip (33) near the outlet of the gas flow tube (40). A portion (35) of the rod-shaped conductor (34) extends into a microwave cavity (24) to receive microwaves passing in the cavity (24). These received microwaves are focused at the tip (33) to heat the gas into plasma. The microwave plasma nozzle (26) also includes a vortex guide (36) between the rod-shaped conductor (34) and the gas flow tube (40) imparting a helical shaped flow direction to the gas flowing through the tube (40). The microwave plasma nozzle (26) further includes a shielding mechanism (108) for reducing a microwave power loss through the gas flow tube (40).
    Type: Grant
    Filed: July 7, 2005
    Date of Patent: October 11, 2011
    Assignees: Amarante Technologies, Inc., Saian Corporation
    Inventors: Sang Hun Lee, Jay Joongsoo Kim
  • Patent number: 7976672
    Abstract: A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
    Type: Grant
    Filed: February 13, 2007
    Date of Patent: July 12, 2011
    Assignee: Saian Corporation
    Inventors: Hidetaka Matsuuchi, Ryuichi Iwasaki, Hirofumi Mankawa, Shigeru Masuda, Hirofumi Hayashi, Masaaki Mike
  • Patent number: 7921804
    Abstract: The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and an impedance controlling structure which adjusts the impedance of the nozzle.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: April 12, 2011
    Assignees: Amarante Technologies, Inc., Saian Corporation
    Inventor: Sang Hun Lee
  • Publication number: 20110008207
    Abstract: A sterilizer includes: a supply source for a sterilizing agent; a first sterilization chamber and a second sterilization chamber each adapted to be filled with the sterilizing agent while placing an object therein so as to subject the object to a sterilization treatment; a first pipe line connecting the supply source and each of the first sterilization chamber and the second sterilization chamber; a second pipe line connecting the first sterilization chamber and the second sterilization chamber; and a supply mechanism adapted to allow a residual part of the sterilizing agent used for the sterilization treatment in the first sterilization chamber to be introduced into the second sterilization chamber via the second pipe line.
    Type: Application
    Filed: March 24, 2009
    Publication date: January 13, 2011
    Applicant: SAIAN CORPORATION
    Inventors: Kiyotaka Arai, Tomoyuki Hirose, Masaaki Mike, Ryuichi Iwasaki
  • Patent number: 7806077
    Abstract: Microwave plasma nozzle array systems and methods for configuring the microwave plasma nozzle arrays are disclosed. The microwaves are transmitted to a microwave cavity in a specific manner and form an interference pattern that includes high-energy regions within the microwave cavity. The high-energy regions are controlled by the phases and the wavelengths of the microwaves. A plurality of nozzle elements is provided in the array. Each of the nozzle elements has a portion partially disposed in the microwave cavity and receives a gas for passing therethrough. The nozzle elements receive microwave energy from one of the high-energy regions. Each of the nozzle elements include a rod-shaped conductor having a tip that focuses the microwaves and a plasma is then generated using the received gas.
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: October 5, 2010
    Assignees: Amarante Technologies, Inc., Saian Corporation
    Inventors: Sang Hun Lee, Jay Joongsoo Kim