Abstract: A shot blasting material used for silicon substrate surface treatment and a method for preparing a silicon substrate. The shot blasting material includes silicon carbide particles, and the median particle diameter of the silicon carbide particles is 1 ?m to 30 ?m. Surface treatment can be performed on at least one surface of a silicon substrate in a bombarding manner through the shot blasting material. The particle diameter of the silicon carbide particles used for bombarding is small, and only a mechanical damage layer with a small thickness is formed on a first surface of the silicon substrate, so in the subsequent chemical treatment procedure, it is not required to add concentrated sulfuric acid to a chemical corrosive liquid, and a corrosion step and a cleaning step may be combined into one step, thereby reducing the process flow time, and decreasing the process cost; meanwhile, the method is environment friendly.