Abstract: A refractory object can include a beta alumina. In an embodiment, the refractory object is capable of being used in a glass fusion process. In another embodiment, the refractory object can have a total Al2O3 content of at least 10% by weight. Additionally, a Mg—Al oxide may not form along a surface of the refractory object when the surface is exposed to a molten glass including an Al—Si—Mg oxide. In a particular embodiment, a refractory object can be in the form of a glass overflow forming block used to form a glass object that includes an Al—Si—Mg oxide. When forming the glass object, the glass material contacts the beta alumina, and during the flowing of the glass material, a Mg—Al oxide does not form along the beta alumina at the surface.

Abstract: A stand-alone photosensor assembly has a housing with an axis, a first axial end and a second axial end opposite the first axial end. An adapter may be threadingly coupled to the first axial end of the housing. The adapter may be adapted to mount the housing to a scintillator. A photosensor element may be located inside the housing and adapted to be optically coupled to the scintillator. A sub-housing may be located inside the housing, at least a portion of which is located radially between the housing and the photosensor element. A scintillator assembly may include a scintillator and the photosensor assembly. A machine, such as a radiation detector, may include the scintillator and the photosensor assembly coupled to the scintillator. The machine also may include an output device to generate output in response to the photosensor assembly, and a user interface coupled to the output device.

Abstract: A method of forming a shaped abrasive particle includes applying a mixture into a shaping assembly within an application zone and directing an ejection material at the mixture in the shaping assembly under a predetermined force, removing the mixture from the shaping assembly and forming a precursor shaped abrasive particle.

Abstract: A scintillation device includes a ceramic scintillator body that includes a polycrystalline ceramic scintillating material comprising gadolinium. The polycrystalline ceramic scintillating material is characterized by a pyrochlore crystallographic structure. A method of producing a ceramic scintillator body includes preparing a precursor solution including a rare earth element precursor, a hafnium precursor, and an activator (Ac) precursor. The method also includes obtaining a precipitate from the solution and calcining the precipitate to produce a polycrystalline ceramic scintillating material including the rare earth element, hafnium, and the activator, and having a pyrochlore titrating the precursor solution into the precipitant solution structure.

Abstract: The disclosure relates to a scintillation pixel array, a radiation sensing apparatus, a scintillation apparatus, and methods of making a scintillation pixel array wherein scintillation pixels have beveled surfaces and a reflective material around the beveled surfaces. The embodiments described herein can reduce the amount of cross-talk between adjacent scintillation pixels.

Abstract: A refractory object can include at least 10 wt % Al2O3. Further, the refractory object may contain less than approximately 6 wt % SiO2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al2O3 in the refractory object can be provided as reactive Al2O3. In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof.

Abstract: A ceramic scintillator body includes a polycrystalline ceramic scintillating material having a substantially cubic crystallographic structure. The polycrystalline ceramic scintillating material has a chemical composition represented by a general formula LU(2-x)GdxO3:Ac, where x is greater than zero and less than two, and where Ac is an activator.

Abstract: A scintillation crystal capable of emitting scintillation light can have a main body and a feature extending from the main body along a side of the scintillation crystal. The feature can have a dimension that is no greater than 2.5 times a wavelength of the scintillating light. In an embodiment, the feature and the main body can have substantially the same composition, and in a further embodiment the scintillation crystal can be interface free between the feature and the main body. The feature can be formed along the side of the scintillation crystal by removing portions of the scintillation crystal. In particular, the feature can be formed by abrading a surface of the scintillation crystal with an abrasive material.

Abstract: An optical fiber can include a polymer and a scintillation quencher. The optical fiber can be a member of a radiation sensor or radiation detecting system. The scintillation quencher can include a UV-absorber or a scintillation resistant material. In one embodiment, the radiation sensor includes a scintillator that is capable of generating a first radiation having a wavelength of at least about 420 nm; and a scintillation quencher is capable of absorbing a second radiation having a wavelength of less than about 420 nm. The optical fiber including a scintillation quencher provides for a method to detect neutrons in a radiation detecting system.

Abstract: A high temperature bonded abrasive includes alumina abrasive grits, and a vitreous bond matrix in which the alumina abrasive grits are distributed, the vitreous bond matrix having a cure temperature not less than 1000° C. The alumina abrasive grits include polycrystalline alpha alumina having a fine crystalline microstructure characterized by an alpha alumina average domain size not greater than 500 nm, and the alumina abrasive grits further include a pinning agent that is a dispersed phase in the polycrystalline alpha alumina.

Abstract: Improved slurry compositions comprising silicon carbide particles and alumina particles dispersed within an aqueous medium. Slurry compositions in the form of abrasive slurry compositions for use chemical mechanical planarization (CMP) processes, particularly abrasive slurry compositions for polishing of sapphire, and methods of use.

Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.

Abstract: An armor component including a body including a ceramic component comprising hBN. In one aspect, the hBN is configured to undergo a phase change upon a projectile impact. In another aspect, the ceramic component may also have a ready state defining a hexagonal lattice structure configured to change from the ready state to an absorbed state defining a cubic lattice structure. The ceramic component may also have a ready state defining a first density and configured to change from the ready state to an absorbed state defining a second density, wherein the first density is less than the second density. In a particular aspect, the ceramic component can be configured to prevent penetration of a projectile having an energy of at least 1500 J upon impact with a strikeface of the ceramic component.

Abstract: An armor component including a body including a material component configured to undergo a phase change upon a projectile impact. The material component may also have a ready state defining a first lattice structure configured to change from the ready state to an absorbed state defining a second lattice structure different from the first lattice structure. The material component may also have a ready state defining a first density and configured to change from the ready state to an absorbed state defining a second density, wherein the first density is less than the second density. In a particular aspect, the material component, in combination with a first component on or adjacent to the material component, can be configured to prevent pentration of a projectile having an energy of 4,000 J upon impact with a strikeface of the material component.

Abstract: A particulate material having a body including a first phase having at least about 70 wt % alumina for a total weight of the first phase, and a second phase comprising phosphorus, wherein the body includes at least about 0.1 wt % of the second phase for the total weight of the body, and wherein the second phase has an average grain size of not greater than about 1 micron.

Abstract: The carrier of the present invention includes at least 85 wt percent alpha alumina, at least 0.06 wt percent SiO2 and no more than 0.04 wt percent Na2O. The carrier has a water absorption no greater than 0.35 g/g and a ratio of water absorption (g/g) to surface area (m2/g) no greater than 0.50 g/m2. Another aspect of the invention is a catalyst for the epoxidation of olefins which comprises the above described carrier and silver dispersed thereon, where the carrier has a monomodal, bimodal or multimodal pore distribution and where the quantity of silver is between 5 and 50 wt %, relative to the weight of the catalyst. A reactor system for the epoxidation of olefins is also disclosed.

Abstract: A refractory object can include at least 10 wt % Al2O3. In an embodiment, the refractory object can further include a dopant including an oxide of a rare earth element, Ta, Nb, Hf, or any combination thereof. In another embodiment, the refractory object may have a property such that the averaged grain size does not increase more than 500% during sintering, an aspect ratio less than approximately 4.0, a creep rate less than approximately 1.0×10?5 ?m/(?m×hr), or any combination thereof. In a particular embodiment, the refractory object can be in the form of a refractory block or a glass overflow forming block. The glass overflow forming block can be useful in forming an Al—Si—Mg glass sheet. In a particular embodiment, a layer including Mg—Al oxide can initially form along exposed surfaces of the glass overflow forming block when forming the Al—Si—Mg glass sheet.

Abstract: Disclosed is a population of ceramic particles that includes a plurality of individual, free flowing particles. The plurality has a total weight and particle size distribution. The effective width of the distribution is the difference between the distribution's d95 and d5 particle sizes. The distribution's effective width exceeds 100 microns and includes three abutting and non-overlapping regions that include a first region, a second region, and a third region. The first region abuts the second region and the second region abuts the third region. The width of the second region is at least 25% of the effective width. The weight of particles in the second region does not exceed 15% of the plurality of particle's total weight. The weight of particles in the first region and the third region each exceed the weight of particles in the second region. Methods of making the populations of ceramic particles are also disclosed.

Abstract: A method of forming a ceramic article includes providing a ceramic body comprising silicon carbide, and treating the ceramic body in an atmosphere comprising an oxidizing material to remove a portion of the ceramic body through a chemical reaction between a portion of the ceramic body and the oxidizing material.

Abstract: The present invention relates to a method for making a hexagonal boron nitride slurry and the resulting slurry. The method involves mixing from about 0.5 wt. % to about 5 wt. % surfactant with about 30 wt. % to about 50 wt. % hexagonal boron nitride powder in a medium under conditions effective to produce a hexagonal boron nitride slurry. The present invention also relates to a method for making a spherical boron nitride powder and a method for making a hexagonal boron nitride paste using a hexagonal boron nitride slurry. Another aspect of the present invention relates to a hexagonal boron nitride paste including from about 60 wt. % to about 80 wt. % solid hexagonal boron nitride. Yet another aspect of the present invention relates to a spherical boron nitride powder, a polymer blend including a polymer and the spherical hexagonal boron nitride powder, and a system including such a polymer blend.