Abstract: An abrasive particle having a body including a first major surface, a second major surface opposite the first major surface, and a side surface extending between the first major surface and the second major surface, such that a majority of the side surface comprises a plurality of microridges.

Abstract: The present disclosure relates to a porous ceramic media that may include a chemical composition, a phase composition, a total open porosity content of at least about 10 vol. % and not greater than about 70 vol. % as a percentage of the total volume of the ceramic media, and a nitric acid resistance parameter of not greater than about 500 ppm. The chemical composition for the porous ceramic media may include SiO2, Al2O3, an alkali component and a secondary metal oxide component selected from the group consisting of an Fe oxide, a Ti oxide, a Ca oxide, a Mg oxide and combinations thereof. The phase composition may include an amorphous silicate, quartz and mullite.

Abstract: A particulate material having a body including a dopant contained in the body, the dopant is non-homogenously distributed throughout the body and the body has a maximum normalized dopant content difference of at least 35%.

Abstract: A composition having a plurality of abrasive particles including alumina, the plurality of abrasive particles have mesoporosity with an average meso branching index of at least 55 junctions/microns2 and a median particle size (D50) of at least 5 microns.

Abstract: A method of forming a batch of shaped adsorbent particles may include applying a precursor mixture into a shaping assembly within an application zone to form a batch of precursor shaped adsorbent particles, drying the batch of precursor shaped adsorbent particles within the shaping assembly to form the batch of shaped adsorbent particles, and ejecting the batch of shaped adsorbent particles from the shaping assembly. The batch of shaped adsorbent particles may have a moisture content of at least about 20 wt. %.

Abstract: A solid ion conductive material can include a complex metal halide. The complex metal halide can include at least one alkali metal element. In an embodiment, the solid ion conductive material including the complex metal halide can be a single crystal. In another embodiment, the ion conductive material including the complex metal halide can be a crystalline material having a particular crystallographic orientation. A solid electrolyte can include the ion conductive material including the complex metal halide.

Abstract: A solid electrolyte material can include a halide-based material having a crystalline structure including a disorder. In an embodiment, the solid electrolyte material can include a crystalline structure include stacking faults. In another embodiment, the solid electrolyte material can include a crystalline phase including a crystalline structure represented by a space group of the hexagonal crystal system or a space group of a rhombohedral lattice system. In another embodiment, the solid electrolyte material can include a crystalline phase including a crystalline structure represented by a monoclinic space group and a unit cell containing a reduced number of halogen atoms.

Abstract: A refractory object may include a zircon body that is intentionally doped with a dopant including an alkaline earth element and aluminum. The refractory object can have an improved creep deformation rate. In an embodiment, the refractory object can have a creep deformation rate of not greater than about 1.8 E-5 h?1 at a temperature of 1350° C. and a stress of 2 MPa. In another embodiment, the zircon body may include an amorphous phase including an alkaline earth metal element.

Abstract: An abrasive particle including a shaped abrasive particle including a body having a plurality of abrasive particles bonded to at least one surface of the body of the shaped abrasive particle.

Abstract: An apparatus can include a housing, a plurality of electrochemical devices disposed within the housing, and a heat exchanger disposed within the housing. The heat exchanger can be faced with an oxidant-containing gas outlet surface of at least one of the plurality of electrochemical devices. The electrochemical devices can include a stack of solid oxide fuel cells, a battery, or a solid oxide electrolyzer cell.

Abstract: Various shaped abrasive particles are disclosed. Each shaped abrasive particle includes a body having at least one major surface and a side surface extending from the major surface. The side surface can includes a toothed portion. The toothed portion can comprise a plurality of teeth. Each one of the teeth can have the same height.

Abstract: A refractory article including a body having central opening extending through at least a portion of the body, the central opening having a receiving surface having a convex curvature. In an embodiment, the body can include a coupling protrusion extending from a portion of an upper surface of the body and a coupling depression on a portion of a bottom surface of the body.

Abstract: An ion conductive layer can include a hygroscopic ion conductive material, such as a halide-based material. In an embodiment, the ion conductive layer can include an organic material, ammonium halide, or a combination thereof.

Abstract: A fluid composition suitable for chemical mechanical polishing a substrate can in include a multi-valent metal borate, at least one oxidizer, and a solvent. The fluid composition can be essentially free of abrasive particles and may achieve a high material removal rate and excellent surface finish.

Abstract: A solid electrolyte material can include an ammonium-containing complex metal halide. In an embodiment, the ammonium-containing complex metal halide can be represented by (NH4)nM3-z(Mek+)fXn+3-z+k*f, wherein 0<n, 0?z<3, 2?k<6, 0?f?1; M comprises at least an alkali metal element, X comprises a halogen, and Me comprises a divalent metal element, a trivalent metal element, a tetravalent metal element, a pentavalent metal element, a hexavalent metal element or any combination thereof.

Abstract: A ceramic composite can include a first ceramic phase and a second ceramic phase. The first ceramic phase can include a silicon carbide. The second phase can include a boron carbide. In an embodiment, the silicon carbide in the first ceramic phase can have a grain size in a range of 0.8 to 200 microns. The first phase, the second phase, or both can further include a carbon. In another embodiment, at least one of the first ceramic phase and the second ceramic phase can have a median minimum width of at least 5 microns.

Abstract: An electrochemical device can include a cathode layer including an ionic conductor material and an electronic conductor material. The cathode layer can include a ratio of (Vi/Ve) of a volume of the ionic conductor material (Vi) to a volume of the electronic conductor material (Ve) of at least 1.3. In an embodiment, the cathode layer can include a median surface diffusion length (Ls) greater than 0.33 microns. In an embodiment, the cathode layer can include a cathode functional layer.

Abstract: A composition suitable for chemical mechanical polishing a substrate can comprise abrasive particles, a multi-valent metal borate, at least one oxidizer and a solvent. The composition can polish a substrate with a high material removal rate and a very smooth surface finish.

Abstract: A refractory object may include a zircon body that may include at least about 0.1 wt. % and not greater than about 5.5 wt. % of an Al2O3 containing component for a total weight of the zircon body. The zircon body may further include at least about 25 wt. % and not greater than about 35 wt. % of a SiO2 component for a total weight of the zircon body.

Abstract: A scintillation crystal can include a sodium halide that is co-doped with thallium and another element. In an embodiment, the scintillation crystal can include NaX:Tl, Me, wherein X represents a halogen, and Me represents a Group 1 element, a Group 2 element, a rare earth element, or any combination thereof. In a particular embodiment, the scintillation crystal has a property including, for radiation in a range of 300 nm to 700 nm, an emission maximum at a wavelength no greater than 430 nm; or an energy resolution less than 6.4% when measured at 662 keV, 22° C., and an integration time of 1 microsecond. In another embodiment, the co-dopant can be Sr or Ca. The scintillation crystal can have lower energy resolution, better proportionality, a shorter pulse decay time, or any combination thereof as compared to the sodium halide that is doped with only thallium.