Patents Assigned to Samsung Eleectronics Co., Ltd.
  • Organometallic precursor for forming metal pattern and method of forming metal pattern using the same
    Patent number: 6599587
    Abstract: Disclosed is an organometallic precursor for forming a metal pattern, having a structure defined by the following Formula 1, and a method of forming the metal pattern using the same, in which the conductive metal pattern is readily formed through an exposing step without using a photo-resist.
    Type: Grant
    Filed: September 11, 2002
    Date of Patent: July 29, 2003
    Assignee: Samsung Eleectronics Co., Ltd.
    Inventors: Min Chul Chung, Soon Taik Hwang, Young Hun Byun, Euk Che Hwang