Abstract: A photosensitive high polymer which is a random copolymer comprising a structural unit represented by the formula ##STR1## wherein A is ##STR2## wherein R is hydrogen, methyl or methoxy and a structural unit represented by the formula ##STR3## the polymer containing about 5 to about 80 mole % of structural units of the formula (I) and having a polymerization degree of about 300 to about 3000, a process for preparing the photosensitive high polymer and a composition comprising the photosensitive high polymer and solvent.
Type:
Grant
Filed:
June 11, 1984
Date of Patent:
December 24, 1985
Assignees:
Director-General of Agency of Industrial Science & Technology, Sanbo Chemical Industries Co., Ltd.