Patents Assigned to Sanbo Chemical Industries Co., Ltd.
  • Patent number: 4560640
    Abstract: A photosensitive high polymer which is a random copolymer comprising a structural unit represented by the formula ##STR1## wherein A is ##STR2## wherein R is hydrogen, methyl or methoxy and a structural unit represented by the formula ##STR3## the polymer containing about 5 to about 80 mole % of structural units of the formula (I) and having a polymerization degree of about 300 to about 3000, a process for preparing the photosensitive high polymer and a composition comprising the photosensitive high polymer and solvent.
    Type: Grant
    Filed: June 11, 1984
    Date of Patent: December 24, 1985
    Assignees: Director-General of Agency of Industrial Science & Technology, Sanbo Chemical Industries Co., Ltd.
    Inventors: Taichi Ichihashi, Wasaburo Kawai, Tadashi Naraoka, Takateru Asano