Patents Assigned to Sandia
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Patent number: 6125453Abstract: Method for computing all-terminal reliability for arbitrarily interconnected networks such as the United States public switched telephone network. The method includes an efficient search algorithm to generate minimal cut sets for nonhierarchical networks directly from the network connectivity diagram. Efficiency of the search algorithm stems in part from its basis on only link failures. The method also includes a novel quantification scheme that likewise reduces computational effort associated with assessing network reliability based on traditional risk importance measures. Vast reductions in computational effort are realized since combinatorial expansion and subsequent Boolean reduction steps are eliminated through analysis of network segmentations using a technique of assuming node failures to occur on only one side of a break in the network, and repeating the technique for all minimal cut sets generated with the search algorithm. The method functions equally well for planar and non-planar networks.Type: GrantFiled: June 30, 1998Date of Patent: September 26, 2000Assignee: Sandia CorporationInventor: Gregory D. Wyss
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Patent number: 6123983Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: September 26, 2000Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6117369Abstract: The present invention relates to a nickel-porphyrin derivative in a matrix, the nickel-porphyrin derivative comprising at least two conformational isomers, a lower-energy-state conformer and a higher-energy-state conformer, such that when the higher-energy-state conformer is generated from the lower-energy-state conformer following absorption of a photon of suitable energy, the time to return to the lower-energy-state conformer is greater than 40 nanoseconds at approximately room temperature. The nickel-porphyrin derivative is useful in optical memory applications.Type: GrantFiled: April 28, 1998Date of Patent: September 12, 2000Assignee: Sandia CorporationInventors: John A. Shelnutt, Songling Jia, Craig Medforth, Dewey Holten, Nora Y. Nelson, Kevin M. Smith
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Patent number: 6115404Abstract: An apparatus and method of controlling a remelting process by providing measured process variable values to a process controller; estimating process variable values using a process model of a remelting process; and outputting estimated process variable values from the process controller. Feedback and feedforward control devices receive the estimated process variable values and adjust inputs to the remelting process. Electrode weight, electrode mass, electrode gap, process current, process voltage, electrode position, electrode temperature, electrode thermal boundary layer thickness, electrode velocity, electrode acceleration, slag temperature, melting efficiency, cooling water temperature, cooling water flow rate, crucible temperature profile, slag skin temperature, and/or drip short events are employed, as are parameters representing physical constraints of electroslag remelting or vacuum arc remelting, as applicable.Type: GrantFiled: February 3, 1999Date of Patent: September 5, 2000Assignee: Sandia CorporationInventors: Lee A. Bertram, Rodney L. Williamson, David K. Melgaard, Joseph J. Beaman, David G. Evans
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Patent number: 6110982Abstract: An epoxy foam comprising a plurality of resins, a plurality of curing agents, at least one blowing agent, at least one surfactant and optionally at least one filler and the process for making. Preferred is an epoxy foam comprising two resins of different reactivities, two curing agents, a blowing agent, a surfactant, and a filler. According to the present invention, an epoxy foam is prepared with tailorable reactivity, exotherm, and pore size by a process of admixing a plurality of resins with a plurality of curing agents, a surfactant and blowing agent, whereby a foamable mixture is formed and heating said foamable mixture at a temperature greater than the boiling temperature of the blowing agent whereby said mixture is foamed and cured.Type: GrantFiled: January 13, 1999Date of Patent: August 29, 2000Assignee: Sandia CorporationInventors: Edward M. Russick, Peter B. Rand
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Patent number: 6110378Abstract: A fluid stream has material selected from the group consisting of radioactive matter and metals removed from it. An example material to be removed is cesium ions. A silico-titanate composition have a mole ratio of Si:Ti of 0.01:1.7 is provided in the fluid stream. The material to be removed is them permitted to bind to the silico-titanate composition. The silico-titanate composition may include a metal dopant MD present in a mole ratio of MD:Ti up to 1.0. The silico-titanate may also be a cation M present in a mole ratio of M:Ti up to 2.0.Type: GrantFiled: October 6, 1995Date of Patent: August 29, 2000Assignee: Sandia CorporationInventors: Rayford G. Anthony, Robert G. Dosch, deceased, Chackumcheril Varughese Philip
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Patent number: 6110844Abstract: A method of reducing particle deposition during the fabrication of microelectronic circuitry is presented. Reduction of particle deposition is accomplished by controlling the relative temperatures of various parts of the deposition system so that a large temperature gradient near the surface on which fabrication is taking place exists. This temperature gradient acts to repel particles from that surface, thereby producing cleaner surfaces, and thus obtaining higher yields from a given microelectronic fabrication process.Type: GrantFiled: September 29, 1995Date of Patent: August 29, 2000Assignee: Sandia CorporationInventors: Daniel J. Rader, Ronald C. Dykhuizen, Anthony S. Geller
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Patent number: 6110393Abstract: A class of epoxy bond and stop etch (EBASE) microelectronic fabrication techniques is disclosed. The essence of such techniques is to grow circuit components on top of a stop etch layer grown on a first substrate. The first substrate and a host substrate are then bonded together so that the circuit components are attached to the host substrate by the bonding agent. The first substrate is then removed, e.g., by a chemical or physical etching process to which the stop etch layer is resistant. EBASE fabrication methods allow access to regions of a device structure which are usually blocked by the presence of a substrate, and are of particular utility in the fabrication of ultrafast electronic and optoelectronic devices and circuits.Type: GrantFiled: April 23, 1998Date of Patent: August 29, 2000Assignee: Sandia CorporationInventors: Jerry A. Simmons, Mark V. Weckwerth, Wes E. Baca
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Patent number: 6103305Abstract: A stress-relieved amorphous-diamond film is formed by depositing an amorphous diamond film with specific atomic structure and bonding on to a substrate, and annealing the film at sufficiently high temperature to relieve the compressive stress in said film without significantly softening said film. The maximum annealing temperature is preferably on the order of 650.degree. C., a much lower value than is expected from the annealing behavior of other materials.Type: GrantFiled: November 23, 1999Date of Patent: August 15, 2000Assignee: Sandia CorporationInventors: Thomas A. Friedmann, John P. Sullivan
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Patent number: 6099573Abstract: A method and apparatus for modeling interactions between bodies. The method comprises representing two bodies undergoing translations and rotations by two hierarchical swept volume representations. Interactions such as nearest approach and collision can be modeled based on the swept body representations. The present invention can serve as a practical tool in motion planning, CAD systems, simulation systems, safety analysis, and applications that require modeling time-based interactions. A body can be represented in the present invention by a union of convex polygons and convex polyhedra. As used generally herein, polyhedron includes polygon, and polyhedra includes polygons.Type: GrantFiled: April 17, 1998Date of Patent: August 8, 2000Assignee: Sandia CorporationInventor: Patrick G. Xavier
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Patent number: 6096656Abstract: A process for forming one or more fluid microchannels on a substrate is disclosed that is compatible with the formation of integrated circuitry on the substrate. The microchannels can be formed below an upper surface of the substrate, above the upper surface, or both. The microchannels are formed by depositing a covering layer of silicon oxynitride over a mold formed of a sacrificial material such as photoresist which can later be removed. The silicon oxynitride is deposited at a low temperature (.ltoreq.100.degree. C.) and preferably near room temperature using a high-density plasma (e.g. an electron-cyclotron resonance plasma or an inductively-coupled plasma). In some embodiments of the present invention, the microchannels can be completely lined with silicon oxynitride to present a uniform material composition to a fluid therein. The present invention has applications for forming microchannels for use in chromatography and electrophoresis.Type: GrantFiled: June 24, 1999Date of Patent: August 1, 2000Assignee: Sandia CorporationInventors: Carolyn M. Matzke, Carol I. H. Ashby, Monica M. Bridges, Ronald P. Manginell
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Patent number: 6093246Abstract: A photonic crystal device and method. The photonic crystal device comprises a substrate with at least one photonic crystal formed thereon by a charged-particle beam deposition method. Each photonic crystal comprises a plurality of spaced elements having a composition different from the substrate, and may further include one or more impurity elements substituted for spaced elements. Embodiments of the present invention may be provided as electromagnetic wave filters, polarizers, resonators, sources, mirrors, beam directors and antennas for use at wavelengths in the range from about 0.2 to 200 microns or longer. Additionally, photonic crystal devices may be provided with one or more electromagnetic waveguides adjacent to a photonic crystal for forming integrated electromagnetic circuits for use at optical, infrared, or millimeter-wave frequencies.Type: GrantFiled: December 19, 1995Date of Patent: July 25, 2000Assignee: Sandia CorporationInventors: Shawn-Yu Lin, Hans W. P. Koops
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Patent number: 6091021Abstract: Photovoltaic cells and methods for making them are disclosed wherein the metallized grids of the cells are used to mask portions of cell emitter regions to allow selective etching of phosphorus-doped emitter regions. The preferred etchant is SF.sub.6 or a combination of SF.sub.6 and O.sub.2. This self-aligned selective etching allows for enhanced blue response (versus cells with uniform heavy doping of the emitter) while preserving heavier doping in the region beneath the gridlines needed for low contact resistance. Embodiments are disclosed for making cells with or without textured surfaces. Optional steps include plasma hydrogenation and PECVD nitride deposition, each of which are suited to customized applications for requirements of given cells to be manufactured.Type: GrantFiled: November 13, 1998Date of Patent: July 18, 2000Assignee: Sandia CorporationInventors: Douglas S. Ruby, William K. Schubert, James M. Gee, Saleem H. Zaidi
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Patent number: 6091186Abstract: A cathode has electropositive atoms directly bonded to a carbon-containing substrate. Preferably, the substrate comprises diamond or diamond-like (sp.sup.3) carbon, and the electropositive atoms are Cs. The cathode displays superior efficiency and durability. In one embodiment, the cathode has a negative electron affinity (NEA). The cathode can be used for field emission, thermionic emission, or photoemission. Upon exposure to air or oxygen, the cathode performance can be restored by annealing or other methods. Applications include detectors, electron multipliers, sensors, imaging systems, and displays, particularly flat panel displays.Type: GrantFiled: November 13, 1996Date of Patent: July 18, 2000Assignees: The Board of Trustees of the Leland Stanford Junior University, Sandia National LaboratoriesInventors: Renyu Cao, Lawrence Pan, German Vergara, Ciaran Fox
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Patent number: 6090302Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 18, 2000Assignee: SandiaInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6085601Abstract: An apparatus and method for preconcentrating particles and vapors. The preconcentrator apparatus permits detection of highly diluted amounts of particles in a main gas stream, such as a stream of ambient air. A main gas stream having airborne particles entrained therein is passed through a pervious screen. The particles accumulate upon the screen, as the screen acts as a sort of selective particle filter. The flow of the main gas stream is then interrupted by diaphragm shutter valves, whereupon a cross-flow of carrier gas stream is blown parallel past the faces of the screen to dislodge the accumulated particles and carry them to a particle or vapor detector, such as an ion mobility spectrometer. The screen may be heated, such as by passing an electrical current there through, to promote desorption of particles therefrom during the flow of the carrier gas. Various types of screens are disclosed.Type: GrantFiled: October 13, 1998Date of Patent: July 11, 2000Assignee: Sandia CorporationInventors: Kevin L. Linker, Frank J. Conrad, Chad A. Custer, Charles L. Rhykerd, Jr.
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Patent number: 6088086Abstract: A new method of operating a scannerless range imaging system (e.g., a scannerless laser radar) has been developed. This method is designed to compensate for nonlinear effects which appear in many real-world components. The system operates by determining the phase shift of the laser modulation, which is a physical quantity related physically to the path length between the laser source and the detector, for each pixel of an image.Type: GrantFiled: September 11, 1995Date of Patent: July 11, 2000Assignee: Sandia CorporationInventors: Maritza Rosa Muguira, John Theodore Sackos, Bart Davis Bradley, Robert Nellums
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Patent number: 6085581Abstract: A method for positioning a first device utilizing a surface having a viewing translation stage, the surface being movable between a first position where the viewing stage is in operational alignment with a first device and a second position where the viewing stage is in operational alignment with a second device. The movable surface is placed in the first position and an image is produced with the first device of an identifiable characteristic of a calibration object on the viewing stage. The moveable surface is then placed in the second position and only the second device is moved until an image of the identifiable characteristic in the second device matches the image from the first device. The calibration object is then replaced on the stage of the surface with a test object, and the viewing translation stage is adjusted until the second device images the area of interest. The surface is then moved to the first position where the test object is scanned with the first device to image the area of interest.Type: GrantFiled: November 18, 1998Date of Patent: July 11, 2000Assignee: Sandia CorporationInventors: Gary D. Jones, Jack E. Houston, Kenneth T. Gillen
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Patent number: 6086957Abstract: A method of preparing metal oxide thin films by a solution method. A .beta.-metal .beta.-diketonate or carboxylate compound, where the metal is selected from groups 8, 9, 10, 11, and 12 of the Periodic Table, is solubilized in a strong Lewis base to form a homogeneous solution. This precursor solution forms within minutes and can be deposited on a substrate in a single layer or a multiple layers to form a metal oxide thin film. The substrate with the deposited thin film is heated to change the film from an amorphous phase to a ceramic metal oxide and cooled.Type: GrantFiled: May 28, 1999Date of Patent: July 11, 2000Assignee: Sandia CorporationInventors: Timothy J. Boyle, David Ingersoll
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Patent number: 6086243Abstract: A method and apparatus for efficiently and rapidly mixing liquids in a system operating in the creeping flow regime such as would be encountered in capillary-based systems. By applying an electric field to each liquid, the present invention is capable of mixing together fluid streams in capillary-based systems, where mechanical or turbulent stirring cannot be used, to produce a homogeneous liquid.Type: GrantFiled: October 1, 1998Date of Patent: July 11, 2000Assignee: Sandia CorporationInventors: Phillip H. Paul, David J. Rakestraw