Abstract: A thermal process device for heat treating a product or plurality of products includes a thermal processing chamber having opposed distal ends and a plurality of controllable heating zones. At least one buffer zone is disposed at each of the distal ends. The buffer zones and heating zones of the thermal processing chamber form a heating element assembly. The heating assembly has an inner and outer surface and a secondary shell is disposed about the outer surface of the heating element assembly and spaced therefrom to form an inlet flow passage for a flow of a temperature adjusting medium along the heating element assembly.

Abstract: The present invention relates to equipment used to manufacture PV cells or modules. In some embodiments, a gas delivery and gas exhaust system are provided for processing a plurality of substrates. The gas delivery and gas exhaust system are designed such that the substrates are exposed in a uniform manner to the gas.

Abstract: Spacer for a vertical support structure of a heating element coil includes a mating feature including complimentary components on first opposing sides of the spacer, a cavity, open to second opposing sides of the spacer, and an extension offset from an axis intersecting the mating features, the extension including a pocket sized to fit an individual loop of the heating element coil. The spacer can be incorporated into a support structure for a heating element coil interlocking adjacent loops of the coil so that they are retained in a collinear and concentric arrangement while allowing the loops of the coil to move freely inward and outward from the central axis in unison.

Abstract: A forced fluid switch including a first plenum in communication with a first port; a second plenum in communication with a second port; a third plenum in switched communication with the first plenum and the second plenum and in communication with a third port; a fourth plenum in switched communication with the first plenum and the second plenum and in communication with a fourth port; and wherein the forced fluid switch has at least a first forced fluid path and a second forced fluid path, wherein in the first forced fluid path, the third plenum is in communication with the first plenum and the fourth plenum is in communication with the second plenum, and wherein in the second forced fluid path, the third plenum is in communication with the second plenum and the fourth plenum is in communication with the first plenum. A method is provided for switching forced fluid.

Abstract: A heating element includes a continuous planar strip and a plurality of mounting members. A path of the continuous strip from a first end to a second end is circuitous and includes a plurality of repeating cycles, each of which includes a plurality of first straight segments, a plurality of second straight segments and a plurality of radiused segments. A length of the first straight segment is greater than a length of the second straight segment and an angular sum of a single cycle of the circuitous path is greater than 360 degrees. The heating element can be incorporated into a heating assembly for, as an example, semiconductor processing equipment.

Abstract: The present invention relates apparatus and methods for treating the surfaces of substrates in a furnace to enhance the subsequent deposition of thin films or to enhance the reaction of the surfaces with gas phase components. Exhaust systems and methods of their use allow the exhaust gases to be conveyed to proper gas treatments facilities. Door seal and inert gas purge systems allow the furnace to be operated safely and minimize the reaction of the process gases in the door seal region.

Abstract: The present invention relates to in-line equipment used to process substrates. In some applications, the equipment is used in the in-line manufacture PV cells or modules. In some embodiments, a heating system is provided that comprises a plurality of heating technologies for the heat treatment of substrates wherein a first heating system is used to rapidly raise the substrate temperature to the desired set point and a second heating system is used to maintain the substrate at the temperature set point throughout the thermal treatment process.

Abstract: Spacer for a vertical support structure of a heating element coil includes a mating feature including complimentary components on first opposing sides of the spacer, a cavity, open to second opposing sides of the spacer, and an extension offset from an axis intersecting the mating features, the extension including a pocket sized to fit an individual loop of the heating element coil. The spacer can be incorporated into a support structure for a heating element coil interlocking adjacent loops of the coil so that they are retained in a collinear and concentric arrangement while allowing the loops of the coil to move freely inward and outward from the central axis in unison.