Abstract: A process for polishing a metal surface, typically based on Al, Mg, Ta, Ti, Zr, Hf or their alloys, comprises a first conventional polishing step by chemical or electrolytic means and a second electrolytic micro-polishing step by anodizing in a mineral, organic or mixed acid solution to form a oxide layer of the barrier type having a thickness between 100 and 500 nm.
Abstract: A process for producing an electrode plate for an electrolytic condenser. According to the process, a fixed or movable substrate is introduced into a chamber, and an oxidizing atmosphere and vaporized aluminum are also introduced into the chamber, under a pressure of 0.8 to 2.3 Pa in a deposit zone. A coating of grain agglomerates comprising a porous matrix of aluminum oxide containing metallic aluminum crystallites arranged randomly within the grains is deposited onto at least one surface of the substrate by condensation from the atmosphere at a rate between 0.03 and 0.2 micrometers per second. The coated substrate is then removed from the chamber and subjected to a chemical or electrochemical stabilization treatment.
Type:
Grant
Filed:
January 20, 1995
Date of Patent:
January 9, 1996
Assignee:
Satma
Inventors:
Francis Allegret, Mohamed Benmalek, Emmanuel Gariel
Abstract: The invention relates to a plate which is intended to produce either an anode or a cathode of an electrolytic condenser. The plate is in the form of an electricity conducting substrate coated with an aluminium based deposit constituted of grain agglomerates where more than 50% by weight of the total deposited aluminium is in oxide state and forms a porous matrix of aluminium oxide containing metallic aluminium crystallites. The invention enables plates to be obtained which have an increased output, and the invention thus enables the condensers which will be associated with them to be of reduced size.
Type:
Grant
Filed:
February 12, 1993
Date of Patent:
July 11, 1995
Assignee:
Satma
Inventors:
Francis Allegret, Mohamed Benmalek, Emmanuel Gariel