Abstract: A memory array provided on a semiconductor substrate includes: (a) channel structures arranged in multiple layers above the semiconductor substrate, each channel structure extending along a first direction substantially parallel a surface of the semiconductor substrate; (b) gate structures each extending along a second direction substantially transverse to the first direction and each being adjacent one of the channel structures, separated therefrom by a layer of memory material; and (c) conductors provided to connect the gate structures with circuitry fabricated in the semiconductor substrate, wherein at each location where one of the gate structure adjacent one of the channel structures, a portion of the gate structure, a portion of the channel structure and the layer of memory material constitute a memory cell of the memory array. Two or more memory cells sharing a channel structure are connected in series to form a NAND string.

Abstract: The present invention provides a non-volatile memory string having serially connected dual-gate devices, in which a first gate dielectric layer adjacent a first gate electrode layer in each dual-gate device is charge-storing and in which the second gate electrode adjacent a non-charge storing gate dielectric layer are connected in common. In one implementation, the second gate electrodes of the dual-gate devices in the memory string are provided by a continuous layer of doped polysilicon, tungsten, tantalum nitride, tungsten nitride or any combination of two or more of these conductors.

Abstract: A memory circuit and a method is provided for programming a dual-gate memory cell without program disturb in other dual-gate memory cells in the memory circuit coupled by common word lines. In one embodiment, the method uses a self-boosting technique on unselected memory cells having source and drain regions in the shared semiconductor layer between their memory devices and their access devices brought to a predetermined voltage close to the threshold voltage of their access devices, thereby rendering the source and drain regions substantially floating. In some embodiments, the source and drain regions are brought to the predetermined voltage via one or more select gates and intervening access gates. In some embodiments, the select gates are overdriven.