Patents Assigned to Schmidt Instruments, Inc.
  • In situ low energy ion doping of materials grown by CVD
    Patent number: 5354584
    Abstract: A material growing by deposition is exposed to a low energy beam of ionized dopant. The ion beam energy is sufficient to implant the dopant in the growing surface of the material. This doping method will work well for any dopant that is substantially immobile in the material at the temperature necessary for deposition growth.
    Type: Grant
    Filed: May 7, 1993
    Date of Patent: October 11, 1994
    Assignee: Schmidt Instruments, Inc.
    Inventor: Howard K. Schmidt
  • Low energy ion doping of growing diamond by CVD
    Patent number: 5234724
    Abstract: A diamond growing by chemical vapor deposition is exposed to a low energy beam of ionized dopant. The ion beam energy is sufficient to implant the dopant in the growing surface of the diamond. This doping method will work well for any dopant that is substantially immobile in the diamond at the temperature necessary for deposition growth.
    Type: Grant
    Filed: August 8, 1991
    Date of Patent: August 10, 1993
    Assignee: Schmidt Instruments, Inc.
    Inventor: Howard K. Schmidt