Abstract: A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains ?1150 ppm OH, a strain double refraction of ?5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of ?T ?0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength ?1=248 nm, laser shot frequency ?300 Hz, laser shot value ?109 and lumination ?10 mJ/cm2, and wavelength ?2=193 nm, laser shot frequency ?300 Hz, laser shot value ?109 and lumination <5 mJ/cm2. Apparatus for producing the preform comprises a horizontally positioned muffle with two different sized openings facing each other. The larger of the openings is for removing the preform, the smaller opening being for introducing a burner. The internal chamber of the muffle narrows from the larger opening to the smaller opening.

Abstract: A synthetic quartz glass preform is produced by flame hydrolysis with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. The preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of &Dgr;T≦0.1%/cm thickness. The quartz glass has been exposed to the following radiation: wavelength &lgr;1=248 nm, laser shot frequency≧300 Hz, laser shot value≧109 and lumination≦10 mJ/cm2, and wavelength &lgr;2=193 nm, laser shot frequency≧300 Hz, laser shot value≧109 and lumination<5 mJ/cm2. Apparatus for producing the preform comprises a horizontally positioned muffle with two different sized openings facing each other. The larger of the openings is for removing the preform, the smaller opening being for introducing a burner.

Abstract: The invention relates to a synthetic quartz glass preform which is produced according to the flame hydrolysis technique with subsequent cooling and is suitable for the application of high-energy DUV radiation in the wave length range under 250 nm. Said preform has a core area which contains ≧1150 ppm OH, a strain double refraction of ≦5 nm/cm and a resistance to high-energy DUV radiation as a result of a transmission reduction of &Dgr; T ≦0.1 %/cm thickness. The quartz glass has been exposed to the following radiation: wavelength &lgr;1=248 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and rumination ≦10 mJ/cm2, and wavelength &lgr;2=193 nm, laser shot frequency ≧300 Hz, laser shot value ≧109 and rumination ≦5 mJ/cm2. A device for producing said preform comprises a horizontally positioned muffle with two different-sized openings facing each other. The larger of said openings is for removing the preform, the smaller opening being for introducing a burner.