Patents Assigned to Schott Solar GmbH
  • Publication number: 20120202313
    Abstract: For forming the separating lines, (5, 6, 7) which are produced in the functional layers (2, 3, 4) deposited on a transparent substrate (1) during manufacture of a photovoltaic module with series-connected cells (C1, C2, . . . ), there are used laser scanners (8) whose laser beam (14) produces in the field (17) scanned thereby a plurality of adjacent separating line sections (18) in the functional layer (2, 3, 4). The laser scanners (8) are then moved relative to the coated substrate (1) in the direction (Y) of the separating lines (5, 6, 7) by a distance corresponding at the most to the length (L) of the scanned field (17) to thereby form continuous separating lines (5, 6, 7) through mutually flush separating line sections (18).
    Type: Application
    Filed: September 9, 2011
    Publication date: August 9, 2012
    Applicant: Schott Solar GmbH
    Inventor: Walter Psyk
  • Patent number: 8021911
    Abstract: For producing a photovoltaic module (1), the front electrode layer (3), the semi-conductor layer (4) and the back electrode layer (5) are patterned by separating lines (6, 7, 8) to form series-connected cells (C1, C2, . . . Cn, Cn+1). The patterning of the front electrode layer (3) and of the semiconductor layer (4) is done with a laser (13) emitting infrared radiation. During patterning of the semiconductor layer (4) the power of the laser (13) is so reduced that the front electrode layer (3) is not damaged.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: September 20, 2011
    Assignee: Schott Solar GmbH
    Inventors: Peter Lechner, Walter Psyk
  • Patent number: 7955582
    Abstract: A method for producing crystallized silicon according to the EFG process by using a shaping part, between which part and a silicon melt, crystallized silicon grows in a growth zone. Inert gas and at least water vapor are fed into the silicon melt and/or growth zone, by means of which the oxygen content of the crystallized silicon is increased. From 50 to 250 ppm of vapor water is added to the inert gas, and the inert gas has an oxygen, CO and/or CO2 content of less than 20 ppm total.
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: June 7, 2011
    Assignee: Schott Solar GmbH
    Inventors: Albrecht Seidl, Ingo Schwirtlich
  • Patent number: 7888585
    Abstract: A photovoltaic module includes a plurality of interconnected submodules. Each submodule has a transparent front electrode layer, a semiconductor layer and a back electrode layer which have separating lines in each case for forming series-connected strip-shaped photovoltaic cells. The outer cells of two adjacent submodules are united into a single tap cell for current collection, the separating lines of the two adjacent submodules being disposed mirror-symmetrically with respect to their common tap cell.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: February 15, 2011
    Assignee: SCHOTT Solar GmbH
    Inventors: Peter Lechner, Walter Psyk, Erwin Heckel
  • Patent number: 7883924
    Abstract: For producing a photovoltaic module (1), the front electrode layer (3), the semi-conductor layer (4) and the back electrode layer (5) are patterned by separating lines (6, 7, 8) to form series-connected cells (C1, C2, . . . Cn, Cn+1) with a laser (14) emitting infrared radiation. During patterning of the semiconductor layer (4) and the back electrode layer (5) the power of the laser (14) is so reduced that the front electrode layer (3) is not damaged.
    Type: Grant
    Filed: January 21, 2009
    Date of Patent: February 8, 2011
    Assignee: Schott Solar GmbH
    Inventors: Peter Lechner, Walter Psyk
  • Publication number: 20100297801
    Abstract: Process for producing strip-shaped and/or point-shaped electrically conducting contacts on a semiconductor component like a solar cell, includes the steps of applying a moist material forming the contacts in a desired striplike and/or point-like arrangement on at least one exterior surface of the semiconductor component; drying the moist material by heating the semiconductor component to a temperature T1 and keeping the semiconductor element at temperature T1 over a time t1; sintering the dried material by heating the semiconductor component to a temperature T2 and keeping the semiconductor component at temperature T2 over a time t2; cooling the semiconductor component to a temperature T3 that is equal or roughly equal to room temperature, and keeping the semiconductor component at temperature T3 over a time T3; cooling the semiconductor component to a temperature T4 with T4??35° C.
    Type: Application
    Filed: May 17, 2010
    Publication date: November 25, 2010
    Applicant: SCHOTT SOLAR GMBH
    Inventors: Henning NAGEL, Wilfried SCHMIDT, Ingo SCHWIRTLICH, Dieter FRANKE
  • Publication number: 20080308892
    Abstract: A semiconductor component including a first layer (10) of a semiconductor material as a substrate, a second layer (12) running on said first layer (10), and at least two intermediate layers (14, 16) made of the materials of the first and second layers running between the first and second layer, where the first intermediate layer (16) facing the second layer (12) may contain a eutectic mixture (18) made of the materials of the first and second layers. The invention is also directed to an electroconductive contact (15, 15a, 15b) forming an electroconductive connection to the first layer and originating at or running through the second layer, as well as to a method for producing the metal-semiconductor contact.
    Type: Application
    Filed: June 12, 2008
    Publication date: December 18, 2008
    Applicant: SCHOTT SOLAR GMBH
    Inventors: Bernd WILDPANNER, Hillmar VON CAMPE, Werner BUSS
  • Publication number: 20080152568
    Abstract: A method for producing crystallized silicon according to the EFG process by using a shaping part, between which part and a silicon melt, crystallized silicon grows in a growth zone. Inert gas and at least water vapor are fed into the silicon melt and/or growth zone, by means of which the oxygen content of the crystallized silicon is increased. From 50 to 250 ppm of vapor water is added to the inert gas, and the inert gas has an oxygen, CO and/or CO2 content of less than 20 ppm total.
    Type: Application
    Filed: December 14, 2007
    Publication date: June 26, 2008
    Applicant: SCHOTT SOLAR GMBH
    Inventors: Albrecht SEIDL, Ingo SCHWIRTLICH
  • Publication number: 20080053367
    Abstract: A method as well as an apparatus for manufacturing a tube according to the EFG-method. To manufacture tubes with a desired even wall thickness, it is proposed to draw the tube from a melt whose temperature can be controllably adjusted section by section.
    Type: Application
    Filed: August 16, 2007
    Publication date: March 6, 2008
    Applicant: SCHOTT SOLAR GMBH
    Inventors: Albrecht SEIDL, Ingo SCHWIRTLICH
  • Publication number: 20070184560
    Abstract: A process for conveying solid particles of irregular geometry, preferably polygonal geometry, through a pipe system, where the solid particles are conveyed by a gas. In order to enable metering through fragments or other solid particles of irregular geometry in desired quantities without any risk of the particles becoming trapped in the pipe system and causing blockages, further solid particles of regular geometry are added to the solids particles of irregular geometry.
    Type: Application
    Filed: March 8, 2005
    Publication date: August 9, 2007
    Applicant: Schott Solar Gmbh
    Inventors: Ingo Schwirtlich, Hilmar Von Campe
  • Patent number: 7253355
    Abstract: The invention relates to a method for constructing a layer structure on an especially fragile flat substrate. In order for thin, fragile flat substrates to be able to be subjected to refinement or construction of semiconductor components, a process is proposed with the steps: Applying an inorganic ceramic phase to the fragile substrate and subsequent heat treatment for hardening and sintering the inorganic ceramic material.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: August 7, 2007
    Assignee: RWE Schott Solar GmbH
    Inventors: Ingo Schwirtlich, Wilfried Schmidt, Hilmar von Campe
  • Publication number: 20070048884
    Abstract: The invention relates to a method and to an arrangement for localizing production errors in a semiconductor component part by generating excess charge carriers in the semiconductor component part and by determining the electric potential in said part. In order to be able to localize production errors with simple measures and without damaging the semiconductor component part, it is suggested that the semiconductor component part be stimulated to become luminescent and that the locally resolved luminescence intensity distribution be determined in order to determine the locally resolved distribution of the electric potential in the semiconductor component part.
    Type: Application
    Filed: August 21, 2006
    Publication date: March 1, 2007
    Applicant: SCHOTT SOLAR GMBH
    Inventor: Henning NAGEL
  • Patent number: 6746709
    Abstract: The invention relates to a method for manufacture of a semiconductor component by the formation of a hydrogenous layer containing silicon on a substrate comprising or containing silicon such as a wafer or film. In order to achieve a good surface and volume passivation, it is proposed that during formation of the siliceous layer in the form of SiNxOy with 0<x≦1.5 and 0≦y≦2 one or more catalytically acting dopants are selectively added into the layer which release hydrogen from the SiNxOy layer. The concentration C of the dopants is 1×1014 cm3≦C≦1021 cm3.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: June 8, 2004
    Assignee: RWE Schott Solar GmbH
    Inventors: Thomas Lauinger, Ingo Schwirtlich, Jens Moschner