Patents Assigned to Schott Solar GmbH
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Publication number: 20120202313Abstract: For forming the separating lines, (5, 6, 7) which are produced in the functional layers (2, 3, 4) deposited on a transparent substrate (1) during manufacture of a photovoltaic module with series-connected cells (C1, C2, . . . ), there are used laser scanners (8) whose laser beam (14) produces in the field (17) scanned thereby a plurality of adjacent separating line sections (18) in the functional layer (2, 3, 4). The laser scanners (8) are then moved relative to the coated substrate (1) in the direction (Y) of the separating lines (5, 6, 7) by a distance corresponding at the most to the length (L) of the scanned field (17) to thereby form continuous separating lines (5, 6, 7) through mutually flush separating line sections (18).Type: ApplicationFiled: September 9, 2011Publication date: August 9, 2012Applicant: Schott Solar GmbHInventor: Walter Psyk
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Patent number: 8021911Abstract: For producing a photovoltaic module (1), the front electrode layer (3), the semi-conductor layer (4) and the back electrode layer (5) are patterned by separating lines (6, 7, 8) to form series-connected cells (C1, C2, . . . Cn, Cn+1). The patterning of the front electrode layer (3) and of the semiconductor layer (4) is done with a laser (13) emitting infrared radiation. During patterning of the semiconductor layer (4) the power of the laser (13) is so reduced that the front electrode layer (3) is not damaged.Type: GrantFiled: January 16, 2009Date of Patent: September 20, 2011Assignee: Schott Solar GmbHInventors: Peter Lechner, Walter Psyk
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Patent number: 7955582Abstract: A method for producing crystallized silicon according to the EFG process by using a shaping part, between which part and a silicon melt, crystallized silicon grows in a growth zone. Inert gas and at least water vapor are fed into the silicon melt and/or growth zone, by means of which the oxygen content of the crystallized silicon is increased. From 50 to 250 ppm of vapor water is added to the inert gas, and the inert gas has an oxygen, CO and/or CO2 content of less than 20 ppm total.Type: GrantFiled: December 14, 2007Date of Patent: June 7, 2011Assignee: Schott Solar GmbHInventors: Albrecht Seidl, Ingo Schwirtlich
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Patent number: 7888585Abstract: A photovoltaic module includes a plurality of interconnected submodules. Each submodule has a transparent front electrode layer, a semiconductor layer and a back electrode layer which have separating lines in each case for forming series-connected strip-shaped photovoltaic cells. The outer cells of two adjacent submodules are united into a single tap cell for current collection, the separating lines of the two adjacent submodules being disposed mirror-symmetrically with respect to their common tap cell.Type: GrantFiled: November 28, 2007Date of Patent: February 15, 2011Assignee: SCHOTT Solar GmbHInventors: Peter Lechner, Walter Psyk, Erwin Heckel
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Patent number: 7883924Abstract: For producing a photovoltaic module (1), the front electrode layer (3), the semi-conductor layer (4) and the back electrode layer (5) are patterned by separating lines (6, 7, 8) to form series-connected cells (C1, C2, . . . Cn, Cn+1) with a laser (14) emitting infrared radiation. During patterning of the semiconductor layer (4) and the back electrode layer (5) the power of the laser (14) is so reduced that the front electrode layer (3) is not damaged.Type: GrantFiled: January 21, 2009Date of Patent: February 8, 2011Assignee: Schott Solar GmbHInventors: Peter Lechner, Walter Psyk
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Publication number: 20100297801Abstract: Process for producing strip-shaped and/or point-shaped electrically conducting contacts on a semiconductor component like a solar cell, includes the steps of applying a moist material forming the contacts in a desired striplike and/or point-like arrangement on at least one exterior surface of the semiconductor component; drying the moist material by heating the semiconductor component to a temperature T1 and keeping the semiconductor element at temperature T1 over a time t1; sintering the dried material by heating the semiconductor component to a temperature T2 and keeping the semiconductor component at temperature T2 over a time t2; cooling the semiconductor component to a temperature T3 that is equal or roughly equal to room temperature, and keeping the semiconductor component at temperature T3 over a time T3; cooling the semiconductor component to a temperature T4 with T4??35° C.Type: ApplicationFiled: May 17, 2010Publication date: November 25, 2010Applicant: SCHOTT SOLAR GMBHInventors: Henning NAGEL, Wilfried SCHMIDT, Ingo SCHWIRTLICH, Dieter FRANKE
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Publication number: 20080308892Abstract: A semiconductor component including a first layer (10) of a semiconductor material as a substrate, a second layer (12) running on said first layer (10), and at least two intermediate layers (14, 16) made of the materials of the first and second layers running between the first and second layer, where the first intermediate layer (16) facing the second layer (12) may contain a eutectic mixture (18) made of the materials of the first and second layers. The invention is also directed to an electroconductive contact (15, 15a, 15b) forming an electroconductive connection to the first layer and originating at or running through the second layer, as well as to a method for producing the metal-semiconductor contact.Type: ApplicationFiled: June 12, 2008Publication date: December 18, 2008Applicant: SCHOTT SOLAR GMBHInventors: Bernd WILDPANNER, Hillmar VON CAMPE, Werner BUSS
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Publication number: 20080152568Abstract: A method for producing crystallized silicon according to the EFG process by using a shaping part, between which part and a silicon melt, crystallized silicon grows in a growth zone. Inert gas and at least water vapor are fed into the silicon melt and/or growth zone, by means of which the oxygen content of the crystallized silicon is increased. From 50 to 250 ppm of vapor water is added to the inert gas, and the inert gas has an oxygen, CO and/or CO2 content of less than 20 ppm total.Type: ApplicationFiled: December 14, 2007Publication date: June 26, 2008Applicant: SCHOTT SOLAR GMBHInventors: Albrecht SEIDL, Ingo SCHWIRTLICH
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Publication number: 20080053367Abstract: A method as well as an apparatus for manufacturing a tube according to the EFG-method. To manufacture tubes with a desired even wall thickness, it is proposed to draw the tube from a melt whose temperature can be controllably adjusted section by section.Type: ApplicationFiled: August 16, 2007Publication date: March 6, 2008Applicant: SCHOTT SOLAR GMBHInventors: Albrecht SEIDL, Ingo SCHWIRTLICH
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Publication number: 20070184560Abstract: A process for conveying solid particles of irregular geometry, preferably polygonal geometry, through a pipe system, where the solid particles are conveyed by a gas. In order to enable metering through fragments or other solid particles of irregular geometry in desired quantities without any risk of the particles becoming trapped in the pipe system and causing blockages, further solid particles of regular geometry are added to the solids particles of irregular geometry.Type: ApplicationFiled: March 8, 2005Publication date: August 9, 2007Applicant: Schott Solar GmbhInventors: Ingo Schwirtlich, Hilmar Von Campe
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Patent number: 7253355Abstract: The invention relates to a method for constructing a layer structure on an especially fragile flat substrate. In order for thin, fragile flat substrates to be able to be subjected to refinement or construction of semiconductor components, a process is proposed with the steps: Applying an inorganic ceramic phase to the fragile substrate and subsequent heat treatment for hardening and sintering the inorganic ceramic material.Type: GrantFiled: December 19, 2002Date of Patent: August 7, 2007Assignee: RWE Schott Solar GmbHInventors: Ingo Schwirtlich, Wilfried Schmidt, Hilmar von Campe
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Publication number: 20070048884Abstract: The invention relates to a method and to an arrangement for localizing production errors in a semiconductor component part by generating excess charge carriers in the semiconductor component part and by determining the electric potential in said part. In order to be able to localize production errors with simple measures and without damaging the semiconductor component part, it is suggested that the semiconductor component part be stimulated to become luminescent and that the locally resolved luminescence intensity distribution be determined in order to determine the locally resolved distribution of the electric potential in the semiconductor component part.Type: ApplicationFiled: August 21, 2006Publication date: March 1, 2007Applicant: SCHOTT SOLAR GMBHInventor: Henning NAGEL
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Patent number: 6746709Abstract: The invention relates to a method for manufacture of a semiconductor component by the formation of a hydrogenous layer containing silicon on a substrate comprising or containing silicon such as a wafer or film. In order to achieve a good surface and volume passivation, it is proposed that during formation of the siliceous layer in the form of SiNxOy with 0<x≦1.5 and 0≦y≦2 one or more catalytically acting dopants are selectively added into the layer which release hydrogen from the SiNxOy layer. The concentration C of the dopants is 1×1014 cm3≦C≦1021 cm3.Type: GrantFiled: October 18, 2002Date of Patent: June 8, 2004Assignee: RWE Schott Solar GmbHInventors: Thomas Lauinger, Ingo Schwirtlich, Jens Moschner