Abstract: A rotatable sputtering target is provided for use in a sputtering system having a plurality of hollow sleeves of sputtering material arranged on a hollow e backing tube so as to form an annular space that is occupied by a bonding agent and a thermally conductive element which is a woven metal mesh.
Abstract: The invention provides an alternative liquid crystal and light emitting display which include at least one Transparent Conductive Oxide layers which comprises a zinc oxide doped with a group III, IV, V, or transition metal dopant, and sputtered from a sputtering target. In a further embodiment, this Transparent Conductive Oxide layer can optionally include a layer of a patternable TCO, such as ITO.
Type:
Grant
Filed:
February 14, 2018
Date of Patent:
April 7, 2020
Assignee:
SCI ENGINEERED MATERIALS, INC.
Inventors:
Robert McGinnis, Jing Yang, Tzu-Chieh Lin
Abstract: The present invention provides a process for the removal of contaminants on a spent sputtering target used in Plasma Vapor Deposition by the steps of grit abrasion, organic solvent cleaning, and being subjected to an electric field in an acidic bath including a surfactant, and followed by subsequent water and air rinse and further grit abrasion. Removal of the contaminants is verified by spectroscopy.
Abstract: The invention provides an alternative liquid crystal and light emitting display which include at least one Transparent Conductive Oxide layers which comprises a zinc oxide doped with a group III, IV, V, or transition metal dopant, and sputtered from a sputtering target. In a further embodiment, this Transparent Conductive Oxide layer can optionally include a layer of a patternable TCO, such as ITO.
Type:
Grant
Filed:
August 10, 2015
Date of Patent:
March 27, 2018
Assignee:
SCI ENGINEERED MATERIALS, INC.
Inventors:
Robert McGinnis, Jing Yang, Tzu-Chieh Lin