Patents Assigned to SE Plasma Inc.
  • Patent number: 6441554
    Abstract: Disclosed is an apparatus for generating low-temp plasma at atmospheric pressure, comprising: a couple of electrodes facing each other at a distance, one of them being connected to a power supply, the other being grounded; a couple of dielectrics with a thickness of 25 &mgr;m-10 mm, positioned on the facing surfaces of the electrodes in such a way as to face each other, one of them having at least one discharge gap therein; and a conductor electrode having at least one tip positioned within the discharge gap, in which an electric field is applied at an intensity of 1-100 KV/cm through the power supply across the electrodes by use of a pulse direct current or an alternating current in a frequency bandwidth of 50 Hz-10 GHz while a reaction gas is fed between the electrodes, so as to induce a hollow cathode discharge, a capillary discharge or the high accumulation of charges from the discharge gap.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: August 27, 2002
    Assignee: SE Plasma Inc.
    Inventors: Kee-Seok Nam, Sang-Ro Lee, Jong-Ju Rha, Koo-Hyun Lee, Jong-Kuk Kim