Abstract: A pouring method and a pouring plant are described. Mould sections (15) are produced piecewise with cavities at two opposite ends thereof. The mold sections are combined in a line (15A-15D), wherein the cavities define a mold cavity (15a) having an exposed pour cup (30). The line of mold sections is advanced incrementally by drive means (16, 162) through an increment length that corresponds to the length of the mold sections (15), to and through a molding station (50). The true lengths of the produced sections (15) are measured and registered. The difference in length between the first mold section (15D) in the line (15A-15D) that lies immediately upstream of a pour cup (30), where a pouring operation was last carried out, and the last mold section (15A) in the line is calculated.

Abstract: A method of improving the linearity of a photo detector of the kind comprising a semiconductor wafer, two resistive layers, each one covering one side of said wafer, a p-n junction separating said two layers, and one pair of electrodes on each resistive layers, each pair of electrodes defining two opposite sides of a right-angled square, whereby two portions of the resistive layers are defined, within said square. Said portions within said square are delimited electrically from the rest of said layers and the p-n junction, for instance by etching, whereby the linearity within this square is increased, and thus the useful area of the detector.