Patents Assigned to Semens Co., Ltd.
  • Dry etcher including etching device and cleaning device
    Patent number: 8685203
    Abstract: Provided is a dry etcher including an etching device and a cleaning device, more particularly, a dry etcher including an etching device and a cleaning device to which a cleaning process is added so as to be used in a metal layer etching process. The dry etcher includes an etching device into which etching gas is injected to etch a layer formed on a substrate, a substrate transfer device transferring the substrate processed by the etching device, and a cleaning device cleaning the substrate transferred by the substrate transfer device.
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: April 1, 2014
    Assignee: Semens Co., Ltd.
    Inventor: Jae-Hyun Choi