Patents Assigned to Semicon Craft Technologies
  • Patent number: 8072008
    Abstract: A high-sensitivity field effect transistor using as a channel ultrafine fiber elements such as carbon nanotube, and a biosensor using it. The field effect transistor comprises a substrate, a source electrode and a drain electrode arranged on the substrate, a channel for electrically connecting the source electrode with the drain electrode, and a gate electrode causing polarization due to the movement of free electrons in the substrate. For example, the substrate has a support substrate consisting of semiconductor or metal, a first insulating film formed on a first surface of the support substrate, and a second insulating film formed on a second surface of the support substrate, the source electrode, the drain electrode, and the channel arranged on the first insulating film, the gate electrode disposed on the second insulating film.
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: December 6, 2011
    Assignees: Mitsumi Electric Co., Ltd., Semicon Craft Technologies
    Inventors: Koichi Mukasa, Kazuhisa Sueoka, Seiji Takeda, Satoshi Hattori, Yoshiki Yamada, Makoto Sawamura, Hiroichi Ozaki, Atsushi Ishii, Motonori Nakamura, Hirotaka Hosoi
  • Publication number: 20080283875
    Abstract: A high-sensitivity field effect transistor using as a channel ultrafine fiber elements such as carbon nanotube, and a biosensor using it. The field effect transistor comprises a substrate, a source electrode and a drain electrode arranged on the substrate, a channel for electrically connecting the source electrode with the drain electrode, and a gate electrode causing polarization due to the movement of free electrons in the substrate. For example, the substrate has a support substrate consisting of semiconductor or metal, a first insulating film formed on a first surface of the support substrate, and a second insulating film formed on a second surface of the support substrate, the source electrode, the drain electrode, and the channel arranged on the first insulating film, the gate electrode disposed on the second insulating film.
    Type: Application
    Filed: December 13, 2007
    Publication date: November 20, 2008
    Applicants: MITSUMI ELECTRIC CO., LTD., Semicon Craft Technologies
    Inventors: Koichi MUKASA, Kazuhisa SUEOKA, Seiji TAKEDA, Satoshi HATTORI, Yoshiki YAMADA, Makoto SAWAMURA, Hiroichi OZAKI, Atsushi ISHII, Motonori NAKAMURA, Hirotaka HOSOI