Patents Assigned to Semiconductor Energy Laboratory Co., Inc.
  • Publication number: 20160126299
    Abstract: As a result of miniaturization of a pixel region associated with an improvement in definition and an increase in a substrate size associated with an increase in area, defects due to precision, bending, and the like of a mask used at the time of evaporation have become issues. A partition including portions with different thicknesses over a pixel electrode (also referred to as a first electrode) in a display region and in the vicinity of a pixel electrode layer is formed, without increasing the number of steps, by using a photomask or a reticle provided with an auxiliary pattern having a light intensity reduction function made of a diffraction grating pattern or a semi-transmissive film.
    Type: Application
    Filed: December 23, 2015
    Publication date: May 5, 2016
    Applicant: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Hideaki KUWABARA, Hideto OHNUMA
  • Patent number: 9114718
    Abstract: An object is to provide a moving object structure capable of reducing power loss caused when power is supplied from a power feeding device to a moving object by wireless communication. Another object is to provide a moving object structure capable of reducing the strength of a radio wave radiated to the surroundings. Before power is supplied to a moving object, a radio wave for alignment of antennas is output from a power feeding device. That is, radio waves are output from a power feeding device in two stages. In a first stage, a radio wave is output to align positions of antennas of the power feeding device and the moving object. In a second stage, a radio wave is output to supply power from the power feeding device to the moving object.
    Type: Grant
    Filed: January 3, 2014
    Date of Patent: August 25, 2015
    Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., INC.
    Inventors: Shunpei Yamazaki, Jun Koyama, Yutaka Shionoiri
  • Patent number: 8643270
    Abstract: When a light-emitting element having an intermediate conductive layer between a plurality of light-emitting layers is formed, the intermediate conductive layer can have transparency; and thus, materials are largely limited and the manufacturing process of an element becomes complicated by a conventional method. A light-emitting element according to the present invention is formed by sequentially stacking a pixel electrode, a first light-emitting layer, an intermediate conductive layer (including an electron injecting layer and a hole-injecting layer, one of which is island-like), a second light-emitting layer and an opposite electrode.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: February 4, 2014
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Shunpei Yamazaki, Ryoji Nomura, Satoshi Seo, Hiroko Abe, Yasuo Nakamura
  • Patent number: 7722919
    Abstract: The present invention is a fabrication method of a light-emitting device characterized by ejecting a solution containing a luminescent material toward an anode or a cathode under a reduced pressure and characterized in that in a duration before the solution is arrived at the anode or the cathode, the solvent in the solution is volatilized, the remaining part of the luminescent material is deposited on the anode or the cathode, and thereby formed a light-emitting layer. By the present invention, a baking process for thickness reduction is not required after applying the solution. Accordingly, it is possible to provide a fabrication method with high throughput although the method is low in cost and simple.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: May 25, 2010
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Shunpei Yamazaki, Masakazu Murakami, Ryoji Nomura, Satoshi Seo
  • Patent number: 6797548
    Abstract: A method of fabricating silicon TFTs (thin-film transistors) is disclosed. The method comprises a crystallization step by laser irradiation effected after the completion of the device structure. First, amorphous silicon TFTs are fabricated. In each of the TFTs, the channel formation region, the source and drain regions are exposed to laser radiation illuminated from above or below the substrate. Then, the laser radiation is illuminated to crystallize and activate the channel formation region, and source and drain regions. After the completion of the device structure, various electrical characteristics of the TFTs are controlled. Also, the amorphous TFTs can be changed to polysilicon TFTs.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: September 28, 2004
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Hongyong Zhang, Naoto Kusumoto
  • Publication number: 20030008429
    Abstract: A technique capable of efficient, high speed processing for the formation of an organic compound layer by using an ink jet method is provided. In the method of forming an organic compound layer by using the ink jet method, a composition containing an organic compound having light emitting characteristics is discharged from an ink head, forming a continuous organic compound layer. The organic compound layer is formed on pixel electrodes aligned in a matrix shape, and is formed in a continuous manner over a plurality of pixel electrodes. A light emitting device is manufactured using organic light emitting elements in accordance with this manufacturing method.
    Type: Application
    Filed: July 3, 2002
    Publication date: January 9, 2003
    Applicant: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Shunpei Yamazaki, Yasuyuki Arai
  • Patent number: 6449024
    Abstract: A brighter active matrix type liquid crystal electro-optical device with a higher contrast, yet having a wider visual angle is realized, said liquid crystal electro-optical device comprises a liquid crystal layer and means for applying an electric field to the liquid crystal layer in the direction parallel to the substrate, wherein the liquid crystal layer comprises a liquid crystal material dispersed in a polymer material. Also a liquid crystal electro-optical device comprising a liquid crystal layer disposed on a substrate is included, wherein the transmission mode or the dispersion mode of an incident light is selected by an electric field applied to the liquid crystal layer in the direction parallel to the liquid crystal layer.
    Type: Grant
    Filed: January 27, 1997
    Date of Patent: September 10, 2002
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Yoshiharu Hirakata, Takeshi Nishi, Rumo Satake
  • Patent number: 5614733
    Abstract: A semiconductor device has a first thin film transistor and a second thin film transistor formed on a substrate. Both of the first and second thin film transistor have a crystallized channel region. One of the first and second thin film transistor is doped with a catalyst metal at a sufficient concentration for promoting the crystallization of the channel region which the other of the first and second thin film transistors is not doped with the catalyst metal.
    Type: Grant
    Filed: December 12, 1994
    Date of Patent: March 25, 1997
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Hongyong Zhang, Toru Takayama, Yasuhiko Takemura
  • Patent number: 5612799
    Abstract: A grey tone display and a driving method are described. The display comprises a light influencing layer, an electrode pad located adjacent to the layer at one side of the layer in order to define a pixel in the layer, an n-channel field effect transistors connected to the electrode pad at its source terminal, a p-channel field effect transistors connected to the electrode pad at its source terminal, a first control line connected to the drain terminal of the n-channel field effect transistor, a second control line connected to the drain terminal of the p-channel field effect transistor, a third control line connected to the gate terminals of the n-channel field effect transistor and the p-channel field effect transistor, and a control circuit for supplying control signals to the first, second and third control lines. By this configuration, the voltage of the electrode pad can be arbitrarily controlled by adjusting the input level at the gate terminals.
    Type: Grant
    Filed: October 13, 1995
    Date of Patent: March 18, 1997
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Shunpei Yamazaki, Akira Mase, Masaaki Hiroki
  • Patent number: 5609774
    Abstract: A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.
    Type: Grant
    Filed: February 10, 1994
    Date of Patent: March 11, 1997
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Shunpei Yamazaki, Masaya Kadono, Kenji Itoh, Toru Takayama, Yasuyuki Arai, Noriya Ishida
  • Patent number: 5595944
    Abstract: A process for fabricating a thin film transistor, which comprises crystallizing an amorphous silicon film, forming thereon a gate insulating film and a gate electrode, implanting impurities in a self-aligned manner, adhering a coating containing a catalyst element which accelerates the crystallization of the silicon film, and annealing the resulting structure at a temperature lower than the deformation temperature of the substrate to activate the doped impurities. Otherwise, the catalyst element can be incorporated into the structure by introducing it into the impurity region by means of ion implantation and the like.
    Type: Grant
    Filed: December 21, 1994
    Date of Patent: January 21, 1997
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Hongyong Zhang, Toru Takayama, Yasuhiko Takemura
  • Patent number: 5559042
    Abstract: A semiconductor device and a method for forming the same. The semiconductor device comprises an insulating or semiconductor substrate, a thermally-contractive insulating film which is formed on said substrate and provided with grooves, and a semiconductor film which is formed on the thermally-contractive insulating film and divided in an islandish form through the grooves. The thermally-contractive insulating film is contracted in a heat process after the semiconductor film is formed.
    Type: Grant
    Filed: July 12, 1994
    Date of Patent: September 24, 1996
    Assignee: Semiconductor Energy Laboratory Co., Inc.
    Inventors: Shunpei Yamazaki, Yasuhiko Takemura