Patents Assigned to Semiconductor Manufacturing International d (Shanghai) Corporation
  • Method and structure for fabricating a halftone mask for the manufacture of semiconductor wafers
    Patent number: 7229932
    Abstract: A method for manufacturing a mask for integrated circuit devices. The method includes providing a quartz substrate having a surface and forming a MoSi film overlying the surface of the quartz substrate. The method also includes patterning the MoSi film overlying the quartz substrate to form a mask pattern. A step of forming an opaque edge structure comprising a carbon bearing material on a portion of the surface around a peripheral region of the mask pattern is also included.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: June 12, 2007
    Assignee: Semiconductor Manufacturing International d (Shanghai) Corporation
    Inventor: Cong Lu