Abstract: A method of fabricating a single-crystal silicon photovoltaic cell includes providing a single-crystal silicon wafer and a structural support member. The single-crystal silicon wafer has a first major surface and a second major surface. Each major surface extends along a major surface plane. The single-crystal silicon wafer has a thickness greater than 100 micrometers and a dimension greater than 50 mm. The method further includes mounting the structural support member to the first major surface or to the second major surface. The method further includes reducing thickness of the single-crystal silicon wafer to a thickness less than or equal to 100 micrometers while the single-crystal silicon wafer is mounted to the structural support member. The method further includes providing the first major surface with a diffusion and a metalization grid and providing the second major surface with a back surface contact.

Abstract: A method of fabricating a single-crystal silicon photovoltaic cell includes providing a single-crystal silicon wafer and a structural support member. The single-crystal silicon wafer has a first major surface and a second major surface. Each major surface extends along a major surface plane. The single-crystal silicon wafer has a thickness greater than 100 micrometers and a dimension greater than 50 mm. The method further includes mounting the structural support member to the first major surface or to the second major surface. The method further includes reducing thickness of the single-crystal silicon wafer to a thickness less than or equal to 100 micrometers while the single-crystal silicon wafer is mounted to the structural support member. The method further includes providing the first major surface with a diffusion and a metalization grid and providing the second major surface with a back surface contact.

Abstract: A method of cleaving off a daughter single crystal substrate from a parent single crystal substrate includes providing a stress-mandrel and the parent a single crystal substrate. The parent single crystal substrate has a major surface and an edge surface that intersects the major surface. The major surface extends along a major surface plane. The stress-mandrel has a stress-mandrel coefficient of thermal expansion that is higher than the parent single crystal coefficient of thermal expansion. The method includes bonding the stress-mandrel to the major surface, and cooling the parent single crystal substrate and the stress-mandrel. The cooling of the parent single crystal substrate bonded to the stress-mandrel provides a thermal stress in the parent single crystal substrate sufficient to cleave the parent single crystal substrate. The cleaving extends substantially along a plane parallel to the plane of the major surface. In one embodiment the cleaved daughter substrate was used to make a photovoltaic cell.