Patents Assigned to Sensistor Technologies AB
  • Patent number: 7448256
    Abstract: A system and a method for determining the leakproofness of an object having a first cavity. The system includes a closed chamber having a second cavity arranged to envelope the object, an evacuator for lowering the pressure inside one of the cavities, a supply for supplying a tracer gas into the one of the cavities rendered the higher pressure, a detector sensitive to the tracer gas and an introducer for introducing a transport gas into the one of the cavities rendered the lower pressure. Furthermore, the evacuator is arranged to compress arriving gas to the ambient pressure of the chamber and to communicate with the detector, which is suited for operation at the ambient pressure of the chamber. The tracer gas includes hydrogen.
    Type: Grant
    Filed: December 2, 2004
    Date of Patent: November 11, 2008
    Assignee: Sensistor Technologies AB
    Inventors: Per Jenneus, Fredrik Enquist
  • Publication number: 20070157704
    Abstract: A system and a method for determining the leakproofness of an object having a first cavity. The system includes a closed chamber having a second cavity arranged to envelope the object, an evacuator for lowering the pressure inside one of the cavities, a supply for supplying a tracer gas into the one of the cavities rendered the higher pressure, a detector sensitive to the tracer gas and an introducer for introducing a transport gas into the one of the cavities rendered the lower pressure. Furthermore, the evacuator is arranged to compress arriving gas to the ambient pressure of the chamber and to communicate with the detecting means, which is suited for operation at the ambient pressure of the chamber. The tracer gas is hydrogen.
    Type: Application
    Filed: December 2, 2004
    Publication date: July 12, 2007
    Applicant: Sensistor Technologies AB
    Inventors: Per Jenneus, Fredrik Enquist
  • Publication number: 20070069313
    Abstract: A hydrogen gas sensitive semiconductor sensor including a catalytic metal layer, a semiconductor layer and an insulator layer arranged between the catalytic metal layer and the semiconductor layer. The catalytic metal layer includes an outer surface and an inner surface including at least one hydrogen atom adsorption surface portion. Each hydrogen atom adsorption surface portion is arranged adjacent to the insulator layer. The surface area of the outer surface is at least 100% larger than the total surface area of all of the at least one hydrogen atom adsorption surface portion. A probe includes the sensor, A hydrogen gas detection system includes the sensor. Use of the sensor for detection of presence of and/or measurement of concentration of hydrogen gas in a gas sample.
    Type: Application
    Filed: September 21, 2006
    Publication date: March 29, 2007
    Applicant: SENSISTOR TECHNOLOGIES AB
    Inventor: Fredrik Enquist
  • Patent number: 6484563
    Abstract: The present invention relates to a method at detection of presence of hydrogen gas and measurement of content of hydrogen gas. The detection is performed by means of a hydrogen gas sensitive semiconductor sensor, whose output signal is used for determination of the content of hydrogen gas in the gas sample. The semiconductor sensor is exposed to the gas sample during a detection interval, which is preceded by a time-interval of preconditioning treatment during which the semiconductor sensor is exposed to a surrounding gas atmosphere. The invention is characterized in that the gas atmosphere contains a negligible amount of oxygen, hydrogen and carbon monoxide compared to the gas sample and that the time interval is many times longer than the detection interval.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: November 26, 2002
    Assignee: Sensistor Technologies AB
    Inventors: Fredrik Enquist, Peter Hebo