Abstract: A process for smoothing curves, comprising previous storage of a predetered number of patterns formed from at least two adjacent pixels disposed on the same line or in the same column, step-by-step calculation of the theoretical curve to be plotted, determination for each of the pitches of the pixel closest to the theoretical curve to be plotted, measurement of the distance e from this pixel to the theoretical curve, determination as a function of this distance e of the pattern which corresponds to the elementary position of the curve to be plotted and illumination of the pattern on a visualization surface.