Patents Assigned to SHANGHAI GALAXY METALLIC YARN CO., LTD
  • Discontinuous vacuum-metalized thin film and wire and method for manufacturing same
    Patent number: 11788180
    Abstract: A method for manufacturing a discontinuous vacuum-metalized thin film includes the following steps: step 1: coating a corona surface of a flexible thin film (1) with a longitudinal discontinuous stripping layer; step 2: coating the corona surface and the stripping layer with a metal layer (3); and step 3: removing the stripping layer and the metal layer (3) on the stripping layer to obtain a discontinuous vacuum-metalized thin film. A method for manufacturing a discontinuous vacuum-metalized wire, a discontinuous vacuum-metalized thin film and a discontinuous vacuum-metalized wire are further disclosed.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: October 17, 2023
    Assignee: SHANGHAI GALAXY METALLIC YARN CO., LTD
    Inventors: Jianhua Bian, Nishikawa Kasumi
  • DISCONTINUOUS VACUUM-METALIZED THIN FILM AND WIRE AND METHOD FOR MANUFACTURING SAME
    Publication number: 20210071288
    Abstract: A method for manufacturing a discontinuous vacuum-metalized thin film includes the following steps: step 1: coating a corona surface of a flexible thin film (1) with a longitudinal discontinuous stripping layer; step 2: coating the corona surface and the stripping layer with a metal layer (3); and step 3: removing the stripping layer and the metal layer (3) on the stripping layer to obtain a discontinuous vacuum-metalized thin film. A method for manufacturing a discontinuous vacuum-metalized wire, a discontinuous vacuum-metalized thin film and a discontinuous vacuum-metalized wire are further disclosed.
    Type: Application
    Filed: January 29, 2019
    Publication date: March 11, 2021
    Applicant: SHANGHAI GALAXY METALLIC YARN CO., LTD
    Inventors: Jianhua BIAN, Nishikawa KASUMI