Patents Assigned to SHANGHAI HUALI MICROEELCTRONICS CORPORATION
  • Patent number: 10203600
    Abstract: A photoresist bottle capable of improving poor coating coverage is disclosed, which comprising: a sealed photoresist bottle body having a connector, a hard groove-shaped projection fixed on the bottom of the bottle body, an inner liner having an opening at the bottom, which is hermetically connected to the groove sidewall of the projection and is used to fill with the photoresist, a nitrogen gas tube inserting into the interspace between the bottle body and the soft liner through the connector, and a photoresist conduit inserting into the soft liner through the connector. Wherein, the top of the inner liner is hermetically connected to the upper lateral wall of the photoresist conduit, the lower end of the photoresist conduit reaches within the groove of the projection. When the soft liner is pressured, since unable to touch the photoresist outlets at the lower end of the photoresist conduit, a blocking can be avoided. Thereby, air bubbles and coating problems are prevented.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: February 12, 2019
    Assignee: SHANGHAI HUALI MICROEELCTRONICS CORPORATION
    Inventors: Zhiguo Zhu, Jun Zhu, Lijun Chen