Patents Assigned to Shanghai Institute of Measurement and Testing Technology
  • Publication number: 20240151666
    Abstract: The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atom lithography technology. A theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is statically placed on a stage of the electron probe microanalysis instrument. The electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, performs image acquisition and measurement on a grid distance of the one-dimensional grating standard template to obtain a grating scanning distance measurement value L, and records a magnification ratio at this time. A calibration factor K under the magnification ratio is calculated according to D and L.
    Type: Application
    Filed: December 15, 2022
    Publication date: May 9, 2024
    Applicants: Shanghai Institute of Measurement and Testing Technology, Tongji University
    Inventors: Lihua LEI, Chengming CAO, Yingfan XIONG, Zhangning XIE, Xiao DENG, Xinbin CHENG, Yuqing GUAN, Wenzhe ZOU, Yunxia FU