Patents Assigned to Shanghia Huali Microelectronics Corporation
  • Method of reducing contamination in CVD chamber
    Patent number: 8974602
    Abstract: The present invention discloses a method of reducing contamination in a CVD chamber. The method comprises cleaning the CVD chamber with first cleaning gases containing NF3; removing the particles in the CVD chamber with second cleaning gases containing N2; further removing the particles in the CVD chamber with third cleaning gases containing O2; and seasoning an amorphous carbon layer with mixed gases containing C2H2 and an inert gas.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: March 10, 2015
    Assignee: Shanghia Huali Microelectronics Corporation
    Inventors: Yadan Zhu, Jun Zhou