Abstract: A solar cell involving a silicon wafer having a basic doping, a light-receiving front side and a backside, which is provided with an interdigital semiconductor pattern, which interdigital semiconductor pattern has a first pattern of at least one first diffusion zone having a first doping and a second pattern of at least one second diffusion zone, separated from the first diffusion zone(s) and having a second doping that differs from the first doping, wherein each second diffusion zone is arranged along the sides of at least one groove extending from the backside into the silicon wafer.

Abstract: The invention relates to a method for structuring an oxide layer applied to a substrate material. The aim of he invention is to provide an inexpensive method for structuring such an oxide layer. To this end, a squeegee paste that contains an oxide-etching component is printed on the oxide layer through a pattern stencil after silk screen printing and the printed squeegee paste is removed after a determined dwelling time.

Abstract: A process for annealing large-area multilayer bodies by supplying a quantity of energy at an annealing rate of at least 1° C./s. To suppress temperature inhomogeneities during the annealing, different partial quantities of the quantity of energy are supplied to the layers of the multilayer body with a local and temporal resolution. The multilayer body is annealed in a container which has a base and a cover made from glass-ceramic. The process is used to produce a thin-film solar module.

Abstract: An appliance for the simultaneous tempering and processing of a plurality of process items with the aid of electromagnetic radiation. The appliance is a stack oven, the process items and the energy sources being arranged on one another in such a way that a process item is present between two energy sources and an energy source is present between two process items. The appliance is particularly suitable for tempering the process items in the presence of a process gas. Using the appliance, a variable heating and cooling profile with variable process parameters is possible. In particular, reliable tempering of a process item in the form of a large-area multilayer body with layers of different physical properties is possible.

Abstract: A process for annealing large-area multilayer bodies by supplying a quantity of energy at an annealing rate of at least 1° C./s. To suppress temperature inhomogeneities during the annealing, different partial quantities of the quantity of energy are supplied to the layers of the multilayer body with a local and temporal resolution. The multilayer body is annealed in a container which has a base and a cover made from glass-ceramic. The process is used to produce a thin-film solar module.

Abstract: A process for annealing large-area multilayer bodies by supplying a quantity of energy at an annealing rate of at least 1° C./s. To suppress temperature inhomogeneities during the annealing, different partial quantities of the quantity of energy are supplied to the layers of the multilayer body with a local and temporal resolution. The multilayer body is annealed in a container which has a base and a cover made from glass-ceramic. The process is used to produce a thin-film solar module.

Abstract: A method and for heat-treating at least one material being processed (3) under a specific process-gas atmosphere (111) of at least one process gas (4) with the aid of a heat-treatment unit (6). The heat-treatment unit has at least one energy source (5) for making the material being processed (3) take up an amount of energy, a heat-treatment container (11) with a heat-treatment space (16) for keeping the material being processed (3) under the process-gas atmosphere (111) during the heat treatment, a heat-treatment chamber (13), in which the heat-treatment container (11) is arranged at a distance (18) from the heat-treatment chamber (13), so that there is an intermediate space (14) between the heat-treatment container (11) and the heat-treatment chamber (13), and an element (19, 191) for producing in the intermediate space (14) a further gas atmosphere (141) of a further gas, different from the process-gas atmosphere (111).