Abstract: A method of manufacturing an array substrate and a display device includes forming a water-soluble organic layer on a surface of a passivation layer, forming a photoresist layer on a surface of the water-soluble organic layer to perform a yellow light process to form a photoresist layer pattern, a cross-section of a water-soluble organic area is less than a cross-section of a bottom surface of a photoresist area, and dry etching the passivation layer such that a cross-section of the passivation layer pattern is the same as a cross-section of the water-soluble organic layer pattern.