Abstract: A conductive polymer composite includes (A) a ?-conjugated polymer and (B) a dopant polymer which contains a repeating unit “a” which is shown by the following general formula (1) having weight-average molecular weight thereof in the range of 1,000 to 500,000, wherein, R1 represents a hydrogen atom or a methyl group; R2 represents a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms which may optionally contain any one of an ether group and an ester group or both; Z represents a phenylene group, a naphthylene group, or an ester group; and “a” is in the range of 0<a?1.0. There can be provided a conductive polymer composite which has excellent filterability and film-formability by spin coating, and also can form a conductive film having high transparency and excellent flatness when the film is formed with the composite.

Abstract: According to the present invention, there is provided a silicon oxide for a non-aqueous electrolyte secondary battery negative electrode material wherein the silicon oxide is a carbon-containing silicon oxide obtained by codeposition from a SiO gas and a carbon-containing gas, an the carbon-containing silicon oxide has a carbon content of 0.5 to 30%. As a result, it is possible to provide a silicon oxide which is capable of manufacturing a non-aqueous electrolyte secondary battery having excellent cycle characteristics and a high capacity in case ox using as a negative electrode material, a method for manufacturing the same, and a lithium ion secondary battery and an electrochemical capacitor using the same.

Abstract: A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11—(CH2)nOCH(CH2CH3)— wherein C6H11 is cyclohexyl and n=0 or 1. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.

Abstract: A resist composition comprising a hydrogenated product of ring-opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance, and lends itself to micropatterning with electron beams or deep-UV.

Abstract: This invention relates to a makeup containing a specific modified silicone obtained by an economical manufacturing method not requiring an esterification catalyst, having a high reaction rate and therefore leaving little unreacted material, and in particular relates to a makeup with good skin adhesion, good retention and excellent emulsion stability. A silicone compound represented by the general formula (1): R1aR2bSiO(4-a-b)/2 (in the formula, R1 is at least one substituent group having 1-30 carbon atoms, chosen from alkyaryl, aralkyl, fluorine-substituted alkyl or organopolysiloxanylsilyl, R2 is a carboxylate residue represented by the following general formula (2): R3 is a saturated or unsaturated hydrocarbon group having 2-30 carbon atoms, a is 1.0-2.5, and b is 0.001-1.5.