Patents Assigned to Shin-Etsu Chemical C., Ltd
  • Positive resist compositions and patterning process
    Patent number: 7449277
    Abstract: A polymer is obtained from (meth)acrylate having a bridged ring lactone group, (meth)acrylate having an acid-labile leaving group, and (meth)acrylate having a hydroxynaphthyl pendant. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development, and leaves minimal residues following development.
    Type: Grant
    Filed: September 20, 2006
    Date of Patent: November 11, 2008
    Assignee: Shin-Etsu Chemical C., Ltd
    Inventors: Jun Hatakeyama, Takeshi Nagata, Takanobu Takeda