Patents Assigned to Shin-Etsu Chemical Co., Inc.
  • Patent number: 7344827
    Abstract: Provided is a contact hole forming method, wherein in a thermal flow step the contact hole size can be fixed after thermal flow even if the resist material lot changes, or, wherein at the same bake temperature the contracted size, namely the flow amount, can be fixed.
    Type: Grant
    Filed: May 4, 2004
    Date of Patent: March 18, 2008
    Assignee: Shin-Etsu Chemical Co., Inc.
    Inventors: Katsuya Takemura, Akihiro Seki, Eiji Fukuda
  • Patent number: 6300010
    Abstract: An object of the present invention is to provide a hydrogen absorbing alloy powder for use in the negative electrodes of alkaline rechargeable batteries which has excellent initial characteristics and a high rate discharge property, exhibits satisfactory life characteristics, and is hence very beneficial from a practical point of view, as well as a process for producing the same. Specifically, the present invention provides a hydrogen absorbing alloy powder for use in the negative electrodes of alkaline rechargeable batteries which has an average particle diameter of 5 to 20 &mgr;m and an oxygen content of 2,000 to 6,000 ppm and, moreover, wherein the oxygen on the surfaces of hydrogen absorbing alloy particles is present in the form of hydroxyl groups.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: October 9, 2001
    Assignee: Shin-Etsu Chemical Co, Inc.
    Inventors: Hajime Nakano, Noriaki Hamaya, Satoshi Shima
  • Patent number: 5508358
    Abstract: Disclosed are a polyester-silicone copolymer which comprises a polyester part containing naphthalene rings and a dimethylpolysiloxane part and has a glass transition temperature of at least 60.degree. C., and a coating composition containing as a main component the aforesaid polyester-silicone copolymer.
    Type: Grant
    Filed: January 26, 1995
    Date of Patent: April 16, 1996
    Assignee: Shin-Etsu Chemical Co., Inc.
    Inventors: Ichiro Ono, Shinji Miyadai
  • Patent number: 5506302
    Abstract: An organopolysiloxane composition contains (A) a both end hydroxyl-blocked diorganopoly-siloxane, (B) a hydroxyl-free diorganopoly-siloxane having a degree of polymerization equal to or greater than that of (A), (C) an organo-hydrogenpolysiloxane having at least three hydrogen atoms in a molecule, (D) an organosilane containing at least two alkoxy groups and an amino group attached to a silicon atom through an alkylene group in a molecule and/or a partial hydrolyzate thereof, (E) a fatty acid metal salt, (F) polycarbonate powder having a mean particle size of up to 50 .mu.m, and optionally (G) an organo-silane containing at least two alkoxy groups and a mercapto group attached to a silicon atom through an alkylene group in a molecule and/or a partial hydrolyzate thereof. It is applied to a rubber substrate to form a wear resistance coating thereon.
    Type: Grant
    Filed: June 21, 1995
    Date of Patent: April 9, 1996
    Assignee: Shin-Etsu Chemical Co., Inc.
    Inventors: Mikio Shiono, Kazumi Okada, Hironao Fujiki
  • Patent number: 5362896
    Abstract: Organic silicone compounds characterized by the possession of a silacyclo ring, which is expressed by the following general formula: ##STR1## wherein R is a monovalent hydrocarbon group and Y is a divalent hydrocarbon group. These organic silicone compounds possess a high reactivity towards compounds having active hydrogens, especially alcohols. Therefore, they are extremely useful as silylation agents, surface treatment agents and adhesion promoters.
    Type: Grant
    Filed: April 7, 1994
    Date of Patent: November 8, 1994
    Assignee: Shin-Etsu Chemical Co., Inc.
    Inventors: Toshiyuki Ozai, Masatoshi Arai, Yoshifumi Inoue
  • Patent number: 4007313
    Abstract: A magnetic recording medium including a flexible non-magnetic film base and a magnetic layer thereon which contains and/or is coated with an organosilicon compound having lubricating properties, said compound having the following formula: ##STR1## WHERE R is a saturated or unsaturated aliphatic group having from 7 to 17 carbon atoms and n is an integer from 1 to 3. The static friction coefficient and the tendency of the magnetic layer to shed powder are both substantially reduced in the improved magnetic recording medium of the present invention.
    Type: Grant
    Filed: October 1, 1975
    Date of Patent: February 8, 1977
    Assignees: Sony Corporation, Shin-Etsu Chemical Co., Inc.
    Inventors: Shigetaka Higuchi, Yoshiaki Hisagen, Minoru Takamizawa, Masatoshi Takita