Patents Assigned to Shin-Etsu Chemical Co.,
  • Patent number: 4888374
    Abstract: A silicone rubber composition comprising an organopolysiloxane and a curing catalyst for the organopolysiloxane. The releasing property of the composition is significantly improved by the addition of N,N'-alkylene bisamide having not less than 10 carbon atoms. The composition is particularly effective for molding in a mold or covering a wire core.
    Type: Grant
    Filed: August 8, 1988
    Date of Patent: December 19, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaharu Takahashi, Takeo Yoshida
  • Patent number: 4886865
    Abstract: The organopolysiloxane composition is useful as a potting or encapsulating material having a gel-like consistency for protecting electronic components even at an extremely low temperature as is encountered in the space industry. The composition is basically of the type in which crosslinks are formed by the addition reaction between silicon-bonded vinyl groups in an organopolysiloxane and silicon-bonded hydrogen atoms in an organohydrogenpolysiloxane but the outstanding cold resistance of the gel-like material obtained from the composition is imparted by incorporating specific silethylene-containing units of the unit formula OSiMe--CH.sub.2 CH.sub.2 --SiMe.sub.2 O.sub.0.5 into the organopolysiloxane in a specified molar content.
    Type: Grant
    Filed: March 18, 1988
    Date of Patent: December 12, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayuki Ikeno, Hironao Fujiki, Hiroshi Inomata
  • Patent number: 4886841
    Abstract: Provided herein is an ultraviolet-curable gel composition which comprises an organopolysiloxane as a principal component which is represented by the general structural formula below. ##STR1## where R.sup.1 is a C.sub.4-25 monovalent organic group containing therein 1 to 2 vinyl functional groups; R.sup.2 is a C.sub.1-18 monovalent organic group having no vinyl group capable of addition polymerization; R.sup.3 is a C.sub.2-4 divalent hydrocarbon group; R.sup.4 is a C.sub.1-9 substituted or unsubstituted hydrocarbon group of the same or different kind; a is an integer of 1 to 3; and n is an integer of 5 to 500.
    Type: Grant
    Filed: January 28, 1988
    Date of Patent: December 12, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinori Hida, Seizi Katayama
  • Patent number: 4885333
    Abstract: A polyvinyl chloride resin-based composition can be imparted with improved thermal stability of compounding the same with a polygylcerin in an amount of 0.01 to 0.5% by weight based on the resin even when the composition is compounded with a heat stabilizer having relatively low effectiveness although the use of such a heat stabilizer is desirable in respect of the physiological inertness. Similar improving effects on the thermal stability of a polyvinyl chloride resin-based composition can be obtained when the resin is prepared by suspension-polymerizing vinyl chloride monomer in an aqueous medium containing a polyglycerin.
    Type: Grant
    Filed: March 23, 1988
    Date of Patent: December 5, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tadashi Amano, Tokuji Abe
  • Patent number: 4883521
    Abstract: An improved sol-gel method is proposed for the preparation of a transparent silica gel block, in which a deposit of fine silica particles having a controlled particle diameter as prepared by hydrolyzing an alkoxy silane in the presence of ammonia is dispersed in a silica sol solution prepared in an acidic condition and settled therein to form a structure of closest-packing prior to gelation, drying, sintering and vitrification so that silica glass blocks can be obtained with low volume shrinkage from the wet gel in an improved yield without cracks, bubbles and haziness. The improvement can be further enhanced when two separately prepared deposits of silica particles having larger and smaller particle diameters are dispersed as combined in the silica sol solution, especially, when the particle diameter in one deposit is not exceeding 22.5% of that in the other deposit.
    Type: Grant
    Filed: September 26, 1988
    Date of Patent: November 28, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takaaki Shimizu, Syuji Tanaka
  • Patent number: 4883569
    Abstract: Cycloalkyl silane compound such as cyclohexyl methyl dichlorosilane can be efficiently prepared by the photochemically induced hydrosilylation reaction. For example, an equimolar mixture of cyclohexene and methyl dichlorosilane with admixture of a catalytic amount of an alcoholic solution of, chloroplatinic acid, is irradiated at a temperature up to 70.degree. C. with ultraviolet light so that the hydrosilylation reaction takes place and proceeds almost to completeness without deactivation of the platinum catalyst to give the desired product in a yield of 90% or even higher.
    Type: Grant
    Filed: February 11, 1988
    Date of Patent: November 28, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Endo, Minoru Takamizawa, Toshinobu Ishihara, Tohru Kubota, Toshio Shinohara
  • Patent number: 4882517
    Abstract: An electroluminescent device of the dispersion type exhibiting high brightness of electroluminescence and having excellent heat resistance and flexibility, and usable as a backlighting unit for liquid crystal displays and as a plane light-emitting body, can be prepared by using, as the matrix material of the particulate electroluminescent material, a specific cyanoalkyl group-containing organopolysiloxane represented by the average unit formula R.sup.1.sub.a R.sup.2.sub.b SiO.sub.(4-a-b)/2, in which R.sup.1 is a cyanoalkyl group having 3 to 5 carbon atoms, R.sup.2 is a monovalent hydrocarbon group, a is 0.8 to 1.8 and b is 0 to 1.0 with the proviso that a+b is 1.1 to 1.98.
    Type: Grant
    Filed: February 7, 1989
    Date of Patent: November 21, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazumasa Maruyama, Tatsushi Kaneko, Tohru Chiba
  • Patent number: 4880927
    Abstract: A method for preparing a cyclic isocyanuric ester having organosilicon groups which comprises thermally treating an isocyanic ester for addition reaction in the presence of an alkali metal hydroxide or alkoxide. By the above reaction, a cyclic trimer of the starting isocyanic ester can be selectively obtained. The catalyst can be readily removed from the reaction system.
    Type: Grant
    Filed: December 3, 1987
    Date of Patent: November 14, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Takago, Yasushi Yamamoto
  • Patent number: 4879339
    Abstract: A room temperature-curable organopolysiloxane composition is proposed which is useful as a material for imprinting or blocking of forms of, for example, medical and dental prostheses without the problem of curing retardation or incomplete curing. The composition comprises a vinyl-containing organopolysiloxane, organohydrogenpolysiloxane, platinum catalyst, inorganic filler, liquid paraffin or petrolatum and antioxidant. The antioxidant serves to protect the liquid paraffin or petrolatum from oxidation to produce oxidized compounds which may deactivate the platinum catalyst to cause curing retardation or incomplete curing.
    Type: Grant
    Filed: March 3, 1988
    Date of Patent: November 7, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masachika Yoshino, Nobuyuki Hasebe, Hironao Fujiki, Hiroshi Inomata
  • Patent number: 4877822
    Abstract: An epoxy resin composition which comprises a curable epoxy resin, a curing agent, an inorganic filler, and at least one copolymer selected from copolymers obtained by an addition reaction between aromatic polymers containing one or more epoxy groups and one or more alkenyl groups and the specific organopolysiloxanes; copolymers obtained by an addition reaction between aromatic polymers containing one or more epoxy groups and the specific amino group-containing organopolysiloxanes.
    Type: Grant
    Filed: April 8, 1988
    Date of Patent: October 31, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Itoh, Toshio Shiobara, Koji Futatsumori, Kazutoshi Tomiyoshi, Hisashi Shimizu
  • Patent number: 4876344
    Abstract: Organosilicon compounds of the following formula, or hydrolyzates thereof, ##STR1## ps in which Rhu 1 l and Rhu 2 l are independently a hydrogen atom or an alkyl group having from 1 to 8 carbon atoms, m is an integer of from 1 to 8, and n is an integer of from 1 to 3. The compound is useful as a vulcanizing agent particularly for vulcanizable elastomer compositions comprising inorganic fillers.
    Type: Grant
    Filed: November 29, 1988
    Date of Patent: October 24, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Itoh, Motoo Fukushima, Tsutomu Nakamura
  • Patent number: 4876298
    Abstract: An epoxy resin composition which is adapted for use as an encapsulator of electronic or electric parts and which comprises an epoxy resin and a curing agent for the epoxy resin. A modified polymer obtained by reaction between an aromatic polymer and a fluorine-containing material is added to the epoxy resin, so that good characteristic properties are imparted to the resultant cured product.
    Type: Grant
    Filed: June 2, 1988
    Date of Patent: October 24, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Itoh, Toshio Shiobara
  • Patent number: 4874416
    Abstract: In place of the conventional rod-in-tube method, a novel method is proposed for the preparation of a high-quality base material of quartz glass for optical fibers according to which a glassy rod composed of the core portion of a larger refractive index and the first cladding layer of a smaller refractive index is first prepared by silica soot deposition by the flame hydrolysis of a gaseous silicon compound followed by dehydration and vitrification, and then the glassy rod is covered with a layer of further silica soot deposition which is subsequently converted to the second cladding layer by vitrification. The inventive base material for optical fibers is excellent in the geometry relative to the diameter of the core portion and thickness of the cladding layer as well as concentricity of the core and the cladding.
    Type: Grant
    Filed: April 25, 1988
    Date of Patent: October 17, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kiyoshi Yokokawa, Kazuo Koya
  • Patent number: 4870115
    Abstract: A foamable silicone rubber composition, comprising:(A) a polyorganosilphenylenesiloxane copolymer represented by Formula (I): ##STR1## wherein R.sup.1 and R.sup.2 are each a particular monohydrocarbon group, and a and h are each an integer of 1 or more and have the relation of 1.gtoreq.a/b.gtoreq.0.05 and a+b.gtoreq.100,(B) an organosilicon compound containing a particular organosiloxy unit having a hydroxyl group,(C) a polyorganohydrogenosiloxane having at least two particular units having an Si--H bond, and(D) a platinum family metal catalyst.This composition can provide a foam with good mechanical strength.
    Type: Grant
    Filed: March 14, 1989
    Date of Patent: September 26, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Itoh, Mitsuo Umemura
  • Patent number: 4869747
    Abstract: A novel method for accelerating growth of a plant in agriculture and forestry is proposed in which an organosilicon compound .omega.-carboxyalkylsilicon sesquioxide, e.g. 2-carboxyethylsilicon sesquioxide, of the unit formulaHOOC(CH.sub.2).sub.n SiO.sub.1.5,in which n is a positive integer of 1 to 4, is applied to the plant directly or to the soil in which the plant is growing. The metal salts or complexes of the above compound as well as the precursor compounds thereof readily convertible to the silsesquioxide compound by hydrolysis are also effective.
    Type: Grant
    Filed: September 17, 1984
    Date of Patent: September 26, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Yoshioka, Akira Yamamoto, Minoru Takamizawa, Toshinobu Ishihara
  • Patent number: 4870149
    Abstract: A solvent-free releasing silicone composition for rendering surfaces non-adherent which gives a cured film having desirable slip factor, toughness, and high-speed peel characteristics without sacrificing its inherenty merits such as curability, uniformity in peel resistance, and the residual adhesive strength employs a diorganovinylpolysiloxane having trivinylsilyloxy as one end group and either a vinyldimethylsilyl or trimethylsilyl group as the other end group.
    Type: Grant
    Filed: July 29, 1988
    Date of Patent: September 26, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuaki Hara, Hisashi Aoki, Kazuma Momii
  • Patent number: 4870035
    Abstract: A process for manufacturing an organic silazane polymer which comprises reacting ammonia with a mixture of methyldichlorosilane, methyltrichlorosilane and dimethyldichlorosilane to obtain an ammonolysis product. The ammonolysis product is polymerized in the presence of a basic catalyst capable of deprotonation to obtain an organic silazane polymer. The silazane polymer may be further melted, shaped and infusibilized. The thus infusibilized product is finally sintered to obtain a ceramic material.
    Type: Grant
    Filed: June 28, 1988
    Date of Patent: September 26, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Minoru Takamizawa, Mitsuo Umemura, Masato Kanari, Yoshihumi Takeda, Akira Hayashida
  • Patent number: 4869854
    Abstract: A process for manufacturing an organic silazane polymer which comprises reacting ammonia with a mixture of at least one compound selected from the group consisting of organic silicon compounds of the following formulae (I) and (II) ##STR1## and at least one compound selected from the group consisting of organic silicon compounds of the following formula (III) ##STR2## in which R represents hydrogen, chlorine, bromine, methyl radical, ethyl radical, phenyl radical or vinyl radical, R.sub.1 represents hydrogen or methyl radical, R.sub.2 represents hydrogen, methyl radical, ethyl radical, phenyl radical or vinyl radical and X represents chlorine or bromine; to obtain an ammonolysis product. The ammonolysis product is polymerized in the presence of a basic catalyst capable of deprotonation to obtain an organic silazane polymer. The silazane polymer may be further melted, shaped and infusibilized. The thus infusibilized product is finally sintered to obtain a ceramic material.
    Type: Grant
    Filed: October 27, 1987
    Date of Patent: September 26, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshihumi Takeda, Minoru Takamizawa, Akira Hayashida
  • Patent number: 4868063
    Abstract: A composition for coating glass fiber articles such as glass sleeve, glass cloth, glass roving, glass tape, glass mat or glass nonwoven fiber, comprising(a) a diorganopolysiloxane end-blocked with a divinylmonoorganosilyl or trivinylsilyl radical at both ends,(b) a sufficient amount of an organohydrogenpolysiloxane containing at least two silicon-bonded hydrogen atoms per molecule to provide at least 0.5 silicon-bonded hydrogen atoms per vinyl radical in component (a), and(c) a catalytic amount of platinum or a platinum compound.
    Type: Grant
    Filed: July 22, 1987
    Date of Patent: September 19, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: yoshio Okamura, Kimitaka Kumagae, Hideyuki Itoh, Shigeru Mori
  • Patent number: 4864003
    Abstract: Disclosed are a block-graft copolymer comprising a polymer block having a repetitive unit represented by General Formula: ##STR1## wherein A represents an organopolysiloxane chain, a polyalkylene oxide chain, a polyalkylene-imine chain, a polyacrylate chain or a polyacryloyl chain,and a process for producing the same. This block-graft copolymer can have various performances such as an oxygen enrichment performance, an ion concentration property, a capability of forming a complex with a metal salt and a biocompatibility, depending on the kind of graft polymer chains.
    Type: Grant
    Filed: August 1, 1988
    Date of Patent: September 5, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Teruo Fujimoto, Mikio Shiono, Osamu Watanabe, Koichi Ito