Patents Assigned to Shin-Etsu Chemical Company, Ltd.
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Patent number: 9567352Abstract: The invention provides a TRIS-containing vinylic monomer which comprises one sole (meth)acryloyloxy group and a tris(trimethylsiloxy)silyl group covalently linked to the ethylenically-unsaturated group through a polyoxyethylene linker. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises monomeric units derived from a TRIS-containing vinylic monomer of the invention. In addition, the invention provides a method for making a TRIS-containing vinylic monomer of the invention.Type: GrantFiled: September 14, 2016Date of Patent: February 14, 2017Assignees: Novartis AG, Shin-Etsu Chemical Company, Ltd.Inventors: Frank Chang, Mamoru Hagiwara, Shoji Ichinohe
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Patent number: 9475827Abstract: The invention provides a TRIS-containing vinylic monomer which comprises one sole (meth)acryloyloxy group and a tris(trimethylsiloxy)silyl group covalently linked to the ethylenically-unsaturated group through a polyoxyethylene linker. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises monomeric units derived from a TRIS-containing vinylic monomer of the invention. In addition, the invention provides a method for making a TRIS-containing vinylic monomer of the invention.Type: GrantFiled: December 13, 2013Date of Patent: October 25, 2016Assignees: SHIN-ETSU CHEMICAL COMPANY, LTD., NOVARTIS AGInventors: Frank Chang, Mamoru Hagiwara, Shoji Ichinohe
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Publication number: 20140273501Abstract: An silicon-containing antireflective coating (SiARC) material is applied on a substrate. The SiARC material which includes a base polymer and may include a boron silicate polymer including silsesquioxane. An etch sequence is utilized, which includes a first wet etch employing a basic solution, a second wet etch employing an acidic solution, and a third wet etch employing another basic solution. The first wet etch can be employed to break up the boron silicate polymer, and the second wet etch can remove the base polymer material, and the third wet etch can remove the residual boron silicate polymer and other residual materials. The SiARC material can be removed from a substrate employing the etch sequence, and the substrate can be reused for monitoring purposes.Type: ApplicationFiled: March 15, 2013Publication date: September 18, 2014Applicants: SHIN-ETSU Chemical Company, Ltd., International Business Machines CorporationInventors: Martin Glodde, Wu-Song Huang, Javier J. Perez, Takeshi Kinsho, Tsutomu Ogihara, Seiichiro Tachibana, Takeru Watanabe
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Patent number: 7691988Abstract: A method is provided for nucleic acid amplification with enhanced sensitivity. The method for enhanced sensitivity involves carrying out the amplification reaction in the presence of gellan. For instance, the method allows for the production of detectible amounts of PCR amplified DNA from at least 10 fold fewer target molecules than a comparable PCR reaction in absence of gellan.Type: GrantFiled: November 20, 2003Date of Patent: April 6, 2010Assignee: Shin-Etsu Chemical Company, Ltd.Inventor: Richard W Armentrout
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Patent number: 7390644Abstract: The present invention is directed to a Sphingomonas bacteria and a method of producing exopolysaccharides by culturing a Shpingomonas bacteria in a fermentation broth for a time and temperature effective for providing a sphingan exopolysaccharide in a slime form.Type: GrantFiled: July 10, 2003Date of Patent: June 24, 2008Assignees: Shin-Etsu Bio., Inc., Shin-Etsu Chemical Company, Ltd.Inventors: Motohide Yamazaki, Marcia Mikolajczak, Thomas J. Pollock, Richard W. Armentrout
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Publication number: 20080073212Abstract: Gellan can be purified from nucleic acid contamination by combining the contaminated gellan with DNase under conditions that allow the DNase to degrade the nucleic acid contaminant. The purified gellan is useful in gel electrophoresis. A buffer which allows cystamine to be used as a reversible cross-linker does not have to be recirculated during the course of a normal gel run.Type: ApplicationFiled: November 30, 2007Publication date: March 27, 2008Applicant: SHIN-ETSU CHEMICAL COMPANY, LTDInventors: Linda Thorne, Richard Armentrout
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Publication number: 20060019354Abstract: The present invention provides nucleic acid sequences and variants thereof capable of modulating exopolysaccharide production in Sphingomonas, and provides methods of using such nucleic acid sequences to generate bacteria that hyper-produce exopolysaccharide in slime form.Type: ApplicationFiled: July 23, 2004Publication date: January 26, 2006Applicant: Shin-Etsu Chemical Company, LtdInventor: Motohide Yamazaki
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Publication number: 20040203114Abstract: A method is provided for nucleic acid amplification with enhanced sensitivity. The method for enhanced sensitivity involves carrying out the amplification reaction in the presence of gellan. For instance, the method allows for the production of detectible amounts of PCR amplified DNA from at least 10 fold fewer target molecules than a comparable PCR reaction in absence of gellan.Type: ApplicationFiled: November 20, 2003Publication date: October 14, 2004Applicant: Shin-Etsu Chemical Company, Ltd.Inventor: Richard W. Armentrout
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Publication number: 20040168920Abstract: Gellan can be purified from nucleic acid contamination by combining the contaminated gellan with DNase under conditions that allow the DNase to degrade the nucleic acid contaminant. The purified gellan is useful in gel electrophoresis. A buffer which allows cystamine to be used as a reversible cross-linker does not have to be recirculated during the course of a normal gel run.Type: ApplicationFiled: November 20, 2003Publication date: September 2, 2004Applicant: Shin-Etsu Chemical Company, LtdInventors: Linda Thorne, Richard W. Armentrout
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Patent number: 6605461Abstract: The present invention is directed to a Sphingomonas bacteria and a method of producing exopolysaccharides by culturing a Shingomonas bacteria in a fermentation broth for a time and temperature effective for providing a sphingan exopolysaccharide in a slime form.Type: GrantFiled: July 13, 2001Date of Patent: August 12, 2003Assignees: Shin-Etsu Bio., Inc., Shin-Etsu Chemical Company, Ltd.Inventors: Motohide Yamazaki, Marcia Mikolajczak, Thomas J. Pollock, Richard W. Armentrout
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Publication number: 20020035249Abstract: The present invention is directed to a Sphingomonas bacteria and a method of producing exopolysaccharides by culturing a Shingomonas bacteria in a fermentation broth for a time and temperature effective for providing a sphingan exopolysaccharide in a slime form.Type: ApplicationFiled: July 13, 2001Publication date: March 21, 2002Applicant: Shin-Etsu Chemical Company, Ltd.Inventors: Motohide Yamazaki, Marcia Mikolajczak, Thomas J. Pollock, Richard W. Armentrout
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Patent number: 5378734Abstract: A UV and moisture-curable organopolysiloxane composition comprising (i) an organopolysiloxane terminated with a radical of formula (1): ##STR1## wherein R.sup.1 is a hydrogen atom or monovalent hydrocarbon radical, each of R.sup.2 and R.sup.3 is a divalent hydrocarbon radical which may contain a NH bond or ether bond, each of R.sup.4 and R.sup.5 is a monovalent hydrocarbon radical which may contain an ether bond, and a is equal to 0 or 1, (ii) a photo-polymerization initiator, and (iii) a curing catalyst. The composition readily cures either upon exposure to UV radiation or upon contact with moisture and from the surface to the deep interior within a short time, yielding cured products having satisfactory physical properties.Type: GrantFiled: August 27, 1993Date of Patent: January 3, 1995Assignee: Shin-Etsu Chemical Company, Ltd.Inventor: Yoshio Inoue
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Patent number: 5366805Abstract: In a polycarbonate resin/silicone rubber integrally molded article, a polycarbonate resin having an aliphatic unsaturated group, typically an isopropenyl group is integrally joined to an addition type silicone rubber containing a tackifier component at high bond strength. It is prepared by injection molding a modified polycarbonate resin into a preform, injection molding a silicone rubber composition over the preform, and curing the composition at a temperature below the softening point of the polycarbonate resin.Type: GrantFiled: December 9, 1993Date of Patent: November 22, 1994Assignee: Shin-Etsu Chemical Company, Ltd.Inventors: Hironao Fujiki, Shigeki Shudo, Akira Matsuda, Noriyoshi Ogawa, Toshiaki Takata
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Patent number: 5340851Abstract: A thermosetting resin composition contains (A) a mixture of an imide compound having an allyl-free maleimide group and an imide compound having an allyl-containing imide group, (B) an epoxy resin, (C) a phenolic resin, and optionally, (D) an aromatic polymer/organo-polysiloxane copolymer. Component (B) and/or (C) includes a compound containing a naphthalene ring having a double bond conjugated with an aromatic ring. The composition is easily workable and well adhesive and cures to products having improved mechanical strength, hot-water resistance, low thermal expansion, and minimized water absorption.Type: GrantFiled: February 12, 1993Date of Patent: August 23, 1994Assignee: Shin-Etsu Chemical Company, Ltd.Inventors: Toshio Shiobara, Hisashi Shimizu, Minoru Takei
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Patent number: 5296418Abstract: A hafnium-containing silazane polymer is obtained through a polymerization reaction of which the reactants are(A) a halide of an organic silicon compound;(B) a hafnium compound having a the formula:HfX.sub.4 [I]wherein X is chlorine or bromine, and(C) a disilazane having the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 may be the same or different and are hydrogen, methyl ethyl, phenyl or vinyl.Type: GrantFiled: October 23, 1992Date of Patent: March 22, 1994Assignee: Shin-Etsu Chemical Company, Ltd.Inventors: Yoshihumi Takeda, Akira Hayashida
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Patent number: 5219921Abstract: An electrically insulating paint composition which is curable at low temperatures from about 60.degree. C. to about 100.degree. C., which comprises (A) an alkenyl group-containing, silanol group-free organopolysiloxane which is a copolymer of three kinds of siloxane units represented by the same general formula (R.sup.1).sub.a SiO.sub.(4-a)/2, wherein R.sup.1 represents an unsubstituted or substituted monovalent hydrocarbon residue, and a's in three different units represent 0, 1 and 3 respectively, said copolymer containing at least two alkenyl groups in a molecule; (B) an organopolyhydrogensiloxane which is a homo- or copolymer containing at least one siloxane unit represented by the general formula (R.sup.2).sub.b SiO.sub.(4-b)/2, wherein R.sup.2 represents hydrogen or an unsubstituted or substituted monovalent hydrocarbon residue, and b satisfies a relation 0.ltoreq.b.ltoreq.Type: GrantFiled: May 27, 1992Date of Patent: June 15, 1993Assignee: Shin-Etsu Chemical Company, Ltd.Inventor: Shiro Gomyo
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Patent number: 5198518Abstract: Polyorganosiloxane resins are prepared through the hydrolytic condensation of organoalkoxysilanes and/or oligomers thereof. By adding a low volatile, weakly acidic compound to the reaction mixture for adjusting the reaction mixture to pH 2-5, the alcohol by-product can be distilled off from the reaction mixture without altering the polyorganosiloxane resins.Type: GrantFiled: November 14, 1991Date of Patent: March 30, 1993Assignee: Shin-Etsu Chemical Company, Ltd.Inventors: Kenji Yamamoto, Ken-Ichi Isobe
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Patent number: 5194647Abstract: Organic silicon compounds of formula (1) are novel. ##STR1## In the formula, wherein R.sup.1 and R.sup.2 are monovalent C.sub.1-8 hydrocarbon group, R.sup.3 is a C.sub.2-6 alkylene group or a C.sub.2-6 alkylene group containing at least one --C--O--C-- linkage, R.sup.4 is a C.sub.1-6 alkyl group, Rf is a C.sub.1-15 perfluoroalkyl or perfluorocycloalkyl group or a C.sub.1-20 perfluoroalkyl or perfluorocycloalkyl group containing at least one --C--O--C-- linkage, and n=0, 1 or 2, m=1 or 2, and k=2, 3 or 4. The organic silicon compounds are useful source materials for the manufacture of fluorinated polysiloxanes having solvent resistance, chemical resistance and release property.Type: GrantFiled: May 29, 1992Date of Patent: March 16, 1993Assignee: Shin-Etsu Chemical Company, Ltd.Inventors: Shinichi Sato, Hirofumi Kishita, Hitoshi Kinami, Hideki Fujii
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Patent number: 5179176Abstract: An epoxy resin having a propenyl group conjugated with an aromatic ring is heat resistant and is easily molded and cured into products having high strength and Tg. It is thus useful as a resin component or modifier.Type: GrantFiled: February 1, 1991Date of Patent: January 12, 1993Assignee: Shin-Etsu Chemical Company, Ltd.Inventors: Toshio Shiobara, Hisashi Shimizu, Takayuki Aoki
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Patent number: 5164442Abstract: The polymeric ingredient of the inventive rubber composition is an acrylic polymer modified with a mercapto-containing organopolysiloxane as prepared by the emulsion polymerization of an acrylic monomer in an aqueous emulsion of the organopolysiloxane. Characteristically, the acrylic monomer is copolymerized with another monomer having an active halogen atom or an epoxy group. By virtue of this unique formulation of the rubbery polymer, the inventive rubber composition prepared by compounding the rubbery polymer with a reinforcing filler and a specified curing or crosslinking agent can be vulcanized to give a vulcanizate having excellent mechanical properties, heat resistance, oil resistance and cold resistance as a combination of the features of silicone rubbers and acrylic rubbers.Type: GrantFiled: April 4, 1990Date of Patent: November 17, 1992Assignees: Shin-Etsu Chemical Company, Ltd., Nissin Chemical Industry Company, Ltd.Inventors: Kunio Itoh, Motoo Fukushima, Tsutomu Nakamura, Hiroyuki Ohata, Harukazu Okuda