Patents Assigned to Shin-Etsu Chemicals Co., Ltd.
  • Publication number: 20060122384
    Abstract: A water-soluble cellulose ether is separated from its suspension by passing a suspension of water-soluble cellulose ether particles in water through a filter of perforated metallic or ceramic filter medium under pressure, removing the filter cake of water-soluble cellulose ether from the filter medium, and cleaning the filter medium with steam, compressed air or water under pressure. The invention enables to separate a water-soluble cellulose ether, especially having a high dissolution temperature, avoids the filter from being clogged, and extends the operative time of the filter.
    Type: Application
    Filed: November 1, 2005
    Publication date: June 8, 2006
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuhisa Hayakawa, Shinichi Kurotani, Mitsuo Narita
  • Publication number: 20060117800
    Abstract: There is provided a method for manufacturing an optical fiber base material by means of a vapor-phase axial deposition method. The method includes preparing a raw material supplying pipe that supplies raw gas centrally and a supporting gas channel and a combustion gas channel that are concentrically disposed outside the pipe, using a multiple flame burner forming a plurality of concentric flames, and generating and depositing glass particles in a state where a condition of Vi<Vm 2Vi is satisfied when linear velocity of a flow of the most inside flame is Vi and linear velocity of the raw gas is Vm. Preferably, the condition satisfies that 1.3Vi<Vm 1.8Vi.
    Type: Application
    Filed: January 9, 2006
    Publication date: June 8, 2006
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Kume, Tadakatsu Shimada
  • Patent number: 7056772
    Abstract: In connection with a semiconductor component having a circuit region and electrodes formed on a substrate surface, the circuit region is sealed by (1) applying a resist material onto the substrate surface to form a resist layer, (2) selectively exposing the resist layer to radiation and developing the resist with a liquid developer for thereby removing only the portion of the resist layer which overlies the circuit region, (3) applying a resin sealant onto the circuit region and curing the resin sealant into a cured resin layer that covers the circuit region, and (4) removing the residual resist layer using a solvent.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: June 6, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Tsutomu Kashiwagi
  • Patent number: 7055295
    Abstract: Herein disclosed is an annular sustained release pheromone-dispenser which has a shape favorable for packaging and transportation, can easily be installed, can maintain its installed condition over a long time period and can easily be handled even after use without any trouble. Also provided is a tool for easily and rapidly installing a pheromone-dispenser at elevated spots of, for instance, fruit trees. The sustained release pheromone-dispenser comprises a plurality of plastic tubes 2a and 2b arranged in parallel and capable of being semi-resiliently deformed, whose ends 3 are connected together by fusion and whose central portions are independent and can form a annular space therebetween by pulling them apart from one another; and a liquid synthetic sex pheromone 1 enclosed in these plurality of plastic tubes 2a, 2b without impairing the pheromone-release capacity.
    Type: Grant
    Filed: October 17, 2000
    Date of Patent: June 6, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Noboru Aiba, Fumiaki Mochizuki, Ryuichi Saguchi
  • Patent number: 7056640
    Abstract: Sulfonyldiazomethane compounds containing a long-chain alkyl- or alkoxy-naphthyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED.
    Type: Grant
    Filed: August 8, 2003
    Date of Patent: June 6, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Satoshi Watanabe, Kazunori Maeda
  • Patent number: 7053233
    Abstract: A silane compound of the following formula (1) having two or more protected functional groups A-R—Si(CH3)nX3-n??(1) wherein A represents a group of the following formula wherein R1, R2 and R3 each independently represent a monovalent hydrocarbon group having 1 to 10 carbon atoms, a is an integer of 1 to 10, and b is an integer of 1 to 10, or wherein R1, R2 and R3 are as defined above, R represents a linear or branched, divalent hydrocarbon group having 2 to 10 carbon atoms, X represents a halogen atom or an organoxy group having 1 to 10 carbon atoms, and n is 0, 1 or 2 is prevented from the reaction of the functional groups per self when undergoing modification or treatment. When the protection is removed after introduction of the protected functional groups, quantitative and efficient introduction of the two or more functional groups is ensured, resulting in more developed effects of modification and addition.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: May 30, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota
  • Patent number: 7052770
    Abstract: A hardcoat composition comprising (A) a hydrolytic condensate of a hydrolyzable silicon compound of formula: R1aSiX(4-a) with at least 1 mole of water per mole of hydrolyzable group X, (B) a metal oxide, (C) a siloxane resin of formula: R2bSi(OR3)c(OH)dO(4-b-c-d)/2 and having a Mw of at least 2,000, which is solid at a temperature of not higher than 40° C., and (D) a curing catalyst forms a hardcoat film having satisfactory hardness, transparency and adhesion as well as improved weather resistance and presenting a surface that is repellent to marker ink.
    Type: Grant
    Filed: June 16, 2003
    Date of Patent: May 30, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Furuya, Koichi Higuchi, Kazuharu Sato, Kazuyuki Matsumura, Masaaki Yamaya
  • Publication number: 20060110664
    Abstract: A pellicle is provided that comprises a pellicle frame that has an upper end face and a lower end face and is a quadrilateral having a side greater than 30 cm or a circle having a diameter of greater than 30 cm, a pellicle film stretched over the upper end face of the pellicle frame, and a pressure-sensitive adhesion layer for affixing an exposure master plate to the pellicle frame, the pressure-sensitive adhesion layer being provided on the lower end face of the pellicle frame, the pressure-sensitive adhesion layer having a thickness of 400 ?m or greater, and the pressure-sensitive adhesion layer having a level of cohesive breaking strength such that the pressure-sensitive adhesion layer does not undergo cohesive failure when peeled off from the pellicle frame or the exposure master plate.
    Type: Application
    Filed: November 23, 2005
    Publication date: May 25, 2006
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Yuichi Hamada
  • Patent number: 7049375
    Abstract: An addition curing silicone rubber composition comprising (A) an alkenyl-containing organopolysiloxane, (B) a resinous copolymer composed mainly of R3SiO1/2 units and SiO2 units in a molar ratio between 0.5/1 and 1.5/1 wherein R stands for a monovalent hydrocarbon group and is substantially free of alkenyl groups, (C) a resinous copolymer composed mainly of R?3SiO1/2 units and SiO2 units in a molar ratio between 0.5/1 and 1.5/1 wherein R? stands for a monovalent hydrocarbon group and includes an alkenyl group, and the total content of alkenyl groups is at least 0.0001 mol/g, (D) an organohydrogenpolysiloxane, and (E) an addition reaction catalyst cures into a silicone rubber sheet that has a satisfactory rubber strength and surface adhesive property.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: May 23, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Noriyuki Meguriya
  • Patent number: 7045572
    Abstract: An organosilicon compound represented by the following general formula (1): wherein R1 is a hydrogen atom, a phenyl group or a halogenated phenyl group; R2 is a hydrogen atom or a methyl group; R3's are each a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; X is a hydrolyzable group; Z1 is —R4—, —R4O— or —R4(CH3)2SiO—, where R4 is a substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms; Z2 is an oxygen atom or a substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms; and m is 0, 1 or 2 and n is 0, 1 or 2. When incorporated in silicone compositions, the organosilicon compound acts as a cross-linking agent having well-balanced photopolymerizability and condensation curability.
    Type: Grant
    Filed: December 20, 2004
    Date of Patent: May 16, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshiyuki Ozai, Hiroyasu Hara, Yoshifumi Inoue, Tomoyuki Goto
  • Publication number: 20060100343
    Abstract: A rubber composition is obtained by mixing (a) a perfluoropolyether-base fluororubber composition having Si—CH?CH2 as crosslinking sites with (b) a silicone rubber composition having the same crosslinking system as component (a). The resulting blend has the advantages of both the fluororubber and silicone rubber compositions.
    Type: Application
    Filed: November 4, 2005
    Publication date: May 11, 2006
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Yasuhisa Osawa
  • Patent number: 7041766
    Abstract: A colorless and transparent thermosetting polyimidesilicone resin comprising structural units of the following general formula (1) and structural units of the general formula (4), said resin being soluble in an organic solvent wherein X is a tetravalent organic group having 4 or more carbon atoms, none of the carbon atoms of X being bound to a plurality of carbonyl groups, Y is a diamine residue and Z is a diaminosiloxane residue.
    Type: Grant
    Filed: October 9, 2003
    Date of Patent: May 9, 2006
    Assignee: Shin-Etsu Chemical Co., LTD
    Inventors: Yoshinori Yoneda, Michihiro Sugo, Hideto Kato
  • Patent number: 7041846
    Abstract: Alicyclic methacrylate compounds having an oxygen substituent group on their ?-methyl group, represented by formula (1), are novel wherein R1 is H or C1–C10 alkyl which may contain a halogen atom, hydroxyl group, ether bond, carbonyl group, carboxyl group or cyano group, and R2 is a monovalent C3–C20 organic group having an alicyclic structure. Polymers prepared from these alicyclic methacrylate compounds have improved transparency, especially at the exposure wavelength of an excimer laser, and improved dry etching resistance.
    Type: Grant
    Filed: March 4, 2004
    Date of Patent: May 9, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Jun Hatakeyama, Takeshi Kinsho
  • Patent number: 7041843
    Abstract: By premixing a sulfide chain-bearing organosilicon compound, a halogenoalkyl group-bearing organosilicon compound, and optionally, sulfur, adding anhydrous sodium sulfide Na2S to the premix, and allowing reaction to take place, a sulfide chain-bearing organosilicon compound having a shorter sulfide chain can be prepared in high yields and at a lost cost while minimizing formation of monosulfide-bearing organosilicon compound.
    Type: Grant
    Filed: March 7, 2003
    Date of Patent: May 9, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideyoshi Yanagisawa, Masaaki Yamaya
  • Patent number: 7037625
    Abstract: A phase shift mask blank is composed of a transparent substrate and a phase shift film thereon. The phase shift film is made of at least two types of layer stacked in alternation, each type having a different composition and containing at least one element selected from among metals, silicon, oxygen and nitrogen. The alternately layered film enables a high-quality phase shift mask blank having improved chemical resistance to be achieved.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: May 2, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideo Kaneko, Yukio Inazuki, Tetsushi Tsukamoto, Satoshi Okazaki
  • Patent number: 7037581
    Abstract: A conductive silicon composite in which particles of the structure that silicon crystallites are dispersed in silicon dioxide are coated on their surfaces with carbon affords satisfactory cycle performance when used as the negative electrode material in a non-aqueous electrolyte secondary cell.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: May 2, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Satoru Miyawaki, Susumu Ueno, Hirofumi Fukuoka, Kazuma Momii
  • Patent number: 7037995
    Abstract: Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.
    Type: Grant
    Filed: September 29, 2003
    Date of Patent: May 2, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa
  • Patent number: 7034536
    Abstract: The present invention provides a magnetic field generator for MRI in which, by simplifying the component parts of the pole pieces incorporated therein, the magnetic field generator for MRI can be manufactured at a lower cost without detracting from its magnetic characteristics. Specifically, the present invention provides an inclined magnetic field generation coil for use in a magnetic field generator for MRI, the coil comprising a plurality of magnetic field regulating holes (17), an electric conductor in coiled form, and a resin base.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: April 25, 2006
    Assignee: Shin-Etsu Chemical Co. Ltd.
    Inventor: Dai Higuchi
  • Patent number: 7034073
    Abstract: A heat conductive silicone composition comprising (a) an organopolysiloxane having alkenyl groups only at both ends of a molecular chain, (b) a heat conductive filler, (c) an organohydrogenpolysiloxane having Si—H groups only at both ends of a molecular chain, and (d) a platinum group curing catalyst is shaped into an article which conforms to a member and permits heat to dissipate from the member without applying stresses thereto.
    Type: Grant
    Filed: November 25, 2003
    Date of Patent: April 25, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Masaya Asaine
  • Patent number: 7035514
    Abstract: A glass base material, which is a base material of an optical fiber, comprising: a core; and a clad surrounding the core; wherein: a rate of change in a relative-refractive-index-difference between the core and the clad in a longitudinal direction of the glass base material is substantially 6% or less.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: April 25, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hiroshi Oyamada