Patents Assigned to Shinetsu Chemical Industries, Ltd.
  • Patent number: 5157086
    Abstract: The invention concerns a novel process for the preparation of poly(N-acylethyleneimine) grafted poysiloxanes comprising sulfoesterifying all or part of alcoholic hydroxyl groups of a hydroxy containing polysiloxane and conducting, in said sulfoesterification reaction mixture, ring-opening polymerization of a 2-oxazoline compound. The present process can afford the desired poly(N-acylethyleneimine) grafted polysiloxane in a higher reaction yield. The invention also provides novel poly(N-acylethyleneimine) grafted polysiloxanes.
    Type: Grant
    Filed: June 26, 1991
    Date of Patent: October 20, 1992
    Assignees: Nippon Paint Co., Ltd., Shinetsu Chemical Industries, Ltd.
    Inventors: Akihiro Kanakura, Yoshio Eguchi, Ryuzo Mizuguchi, Mitsuhiro Takarada, Yoshio Okamura, Hideyuki Itoh
  • Patent number: 5066720
    Abstract: A resinous composition for coating use comprising(a) 3 to 70% by weight of organopolysiloxane represented by the formula:R.sup.1.sub.n R.sup.2.sub.m SiO.sub.(4-n-m)/2wherein R.sup.1 represents hydrogen, allyloxy group, an alkoxy group having 1 to 20 carbon atoms, an aryl group, methyl group, or an organic group having 2 to 100 carbon atoms; R.sup.2 is a hydroxyl group bearing organic group having 2 to 100 carbon atoms; m and n each represents a positive number fulfilling the requirements of 0<n<4, 0<m<4 and 2.ltoreq.m+n<4, having a number average molecular weight of 200 to 100,000 and a hydroxyl value of 20 to 400.(b) 97 to 30% by weight of hydroxyl group containing resin having a hydroxyl value of 20 to 300, and(c) crosslinking agent which is reactive with a hydroxyl groupThis composition is particularly useful in the area where durability and weather resistance of the formed coating are specifically required.
    Type: Grant
    Filed: February 21, 1989
    Date of Patent: November 19, 1991
    Assignees: Nippon Paint Co., Ltd., Shinetsu Chemical Industries, Ltd.
    Inventors: Hiroharu Ohsugi, Akihiro Kanakura, Hirotoshi Umemoto, Yoshio Okamura, Mitsuhiro Takarada, Kenji Yamamoto